Bis(fluoroalcohol) Monomers and Polymers:  Improved Transparency Fluoropolymer Photoresists for Semiconductor Photolithography at 157 nm

Novel norbornene and [4.2.1.02,5]tricyclononene monomers bearing two hexafluoro-2-propanol substituents are polymerized with tetrafluoroethylene in solution, giving amorphous, largely alternating copolymers. The norbornene copolymer shows excellent transparency at 157 nm and a dissolution rate in aq...

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Veröffentlicht in:	Macromolecules 2006-02, Vol.39 (4), p.1443-1448
Hauptverfasser:	Feiring, Andrew E, Crawford, Michael K, Farnham, William B, French, Roger H, Leffew, Kenneth W, Petrov, Viacheslav A, Schadt, Frank L, Tran, Hoang V, Zumsteg, Fredrick C
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied sciences Exact sciences and technology Organic polymers Physicochemistry of polymers Polymers with particular properties Preparation, kinetics, thermodynamics, mechanism and catalysts
Online-Zugang:	Volltext
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