Guided Self-Assembly of Symmetric Diblock Copolymer Films on Chemically Nanopatterned Substrates

Self-assembled films of octadecyltrichlorosilane were patterned with regions of different chemical functionality using extreme ultraviolet interferometric lithography. Unexposed regions of the imaging layers remain terminated in methyl groups, and exposed regions are modified so as to be terminated...

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Veröffentlicht in:	Macromolecules 2000-12, Vol.33 (26), p.9575-9582
Hauptverfasser:	Yang, Xiao M, Peters, Richard D, Nealey, Paul F, Solak, Harun H, Cerrina, Franco
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied sciences Exact sciences and technology Organic polymers Physicochemistry of polymers Properties and characterization Structure, morphology and analysis
Online-Zugang:	Volltext
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