Correlation of Relative X-ray Photoelectron Spectroscopy Shake-up Intensity with CuO Particle Size
X-ray photoelectron spectroscopy (XPS) analysis of four Cu/SiO2 catalyst systems of different particle sizes of CuO on the surface showed variation in the relative peak area intensities of the shake-up lines to main core levels of the Cu 2p orbitals. These differences were attributed to various degr...
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Veröffentlicht in: | Langmuir 1999-04, Vol.15 (8), p.2806-2808 |
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Sprache: | eng |
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Zusammenfassung: | X-ray photoelectron spectroscopy (XPS) analysis of four Cu/SiO2 catalyst systems of different particle sizes of CuO on the surface showed variation in the relative peak area intensities of the shake-up lines to main core levels of the Cu 2p orbitals. These differences were attributed to various degrees of XPS-induced reduction of CuO initially formed on the surface by spin coating copper(II) acetate {Cu(CH3CO2)2·H2O, Cu(ac)2} solutions of varying concentration. Changes in Cu L3M4,5M4,5 X-ray excited Auger (XAES) line shapes under time-dependent exposure to the soft Mg Kα X-rays revealed that smaller particle sizes were more susceptible to reduction to Cu(+1) than larger ones. The degree of reduction of Cu(+2) to Cu(+1) correlated with measured atomic force microscopic (AFM) particle heights of CuO on these substrates prior to XPS. |
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ISSN: | 0743-7463 1520-5827 |
DOI: | 10.1021/la9815446 |