Anhydrous Halogen Acid Interaction with Polyaniline Membranes:  A Gas Permeability Study

Anhydrous Halogen Acid Interaction with Polyaniline Membranes:  A Gas Permeability Study

Anhydrous halogen acids react with polyaniline films in a very different manner than aqueous halogen acids. While aqueous acid-doped films can be readily undoped in aqueous base leaving little residual halide behind, some anhydrous acid-doped films, undoped with anhydrous ammonia followed by sublima...

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Veröffentlicht in:Journal of physical chemistry (1952) 1996-05, Vol.100 (20), p.8425-8429
Hauptverfasser: Conklin, Jeanine A, Anderson, Mark R, Reiss, Howard, Kaner, Richard B
Format: Artikel
Sprache:eng
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Zusammenfassung:Anhydrous halogen acids react with polyaniline films in a very different manner than aqueous halogen acids. While aqueous acid-doped films can be readily undoped in aqueous base leaving little residual halide behind, some anhydrous acid-doped films, undoped with anhydrous ammonia followed by sublimation of the ammonium halide, leave a significant amount of residual halide behind. This varies from approximately 2.8% Cl for HCl(g), to 1.3% Br for HBr(g), to 0.4% I for HI(g) to HCl(aq) > HBr(aq) ≥ HI(aq) which parallels the size of the solvated halogen acids.
ISSN:0022-3654
1541-5740
DOI:10.1021/jp953416l