Extended X-ray Absorption Fine Structure and X-ray Diffraction Examination of Sputtered Nickel Carbon Binary Thin Films for Fuel Cell Applications
Extended X-ray absorption fine structure (EXAFS) and X-ray diffraction (XRD) are used to study the structure of sputtered binary nickel carbon alloy films (5–44 atom % Ni) for use as potential electrocatalysts in acidic solutions. Three compositional regions are identified: “low” (5 atom % Ni), wher...
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Veröffentlicht in: | Journal of physical chemistry. C 2012-03, Vol.116 (10), p.6159-6165 |
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container_title | Journal of physical chemistry. C |
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creator | Ingham, Bridget Gaston, Nicola Fahy, Kieran Chin, Xiao Yao Dotzler, Christian J Rees, Eric Haslam, Gareth Barber, Zoe H Burstein, G. Timothy Ryan, Mary P |
description | Extended X-ray absorption fine structure (EXAFS) and X-ray diffraction (XRD) are used to study the structure of sputtered binary nickel carbon alloy films (5–44 atom % Ni) for use as potential electrocatalysts in acidic solutions. Three compositional regions are identified: “low” (5 atom % Ni), where the structure consists mainly of isolated Ni atoms or dimers in a carbon matrix; “medium” (11–24 atom % Ni), where the Ni–Ni nearest-neighbor coordination is increased but there is little longer-range order; and “high” (35–44 atom % Ni), where crystalline Ni3C is formed. This indicates a threshold concentration of Ni of between 25 and 35 at% before Ni3C starts to form. |
doi_str_mv | 10.1021/jp207308g |
format | Article |
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Timothy ; Ryan, Mary P</creator><creatorcontrib>Ingham, Bridget ; Gaston, Nicola ; Fahy, Kieran ; Chin, Xiao Yao ; Dotzler, Christian J ; Rees, Eric ; Haslam, Gareth ; Barber, Zoe H ; Burstein, G. Timothy ; Ryan, Mary P</creatorcontrib><description>Extended X-ray absorption fine structure (EXAFS) and X-ray diffraction (XRD) are used to study the structure of sputtered binary nickel carbon alloy films (5–44 atom % Ni) for use as potential electrocatalysts in acidic solutions. Three compositional regions are identified: “low” (5 atom % Ni), where the structure consists mainly of isolated Ni atoms or dimers in a carbon matrix; “medium” (11–24 atom % Ni), where the Ni–Ni nearest-neighbor coordination is increased but there is little longer-range order; and “high” (35–44 atom % Ni), where crystalline Ni3C is formed. This indicates a threshold concentration of Ni of between 25 and 35 at% before Ni3C starts to form.</description><identifier>ISSN: 1932-7447</identifier><identifier>EISSN: 1932-7455</identifier><identifier>DOI: 10.1021/jp207308g</identifier><language>eng</language><publisher>Columbus, OH: American Chemical Society</publisher><subject>Applied sciences ; Cross-disciplinary physics: materials science; rheology ; Deposition by sputtering ; Direct energy conversion and energy accumulation ; Electrical engineering. Electrical power engineering ; Electrical power engineering ; Electrochemical conversion: primary and secondary batteries, fuel cells ; Exact sciences and technology ; Materials science ; Methods of deposition of films and coatings; film growth and epitaxy ; Physics</subject><ispartof>Journal of physical chemistry. C, 2012-03, Vol.116 (10), p.6159-6165</ispartof><rights>Copyright © 2012 American Chemical Society</rights><rights>2014 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-a289t-c417c764fc9a28418e93a6a37015c394a6a3040d0b697864ee7a02a34b0f638a3</citedby><cites>FETCH-LOGICAL-a289t-c417c764fc9a28418e93a6a37015c394a6a3040d0b697864ee7a02a34b0f638a3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://pubs.acs.org/doi/pdf/10.1021/jp207308g$$EPDF$$P50$$Gacs$$H</linktopdf><linktohtml>$$Uhttps://pubs.acs.org/doi/10.1021/jp207308g$$EHTML$$P50$$Gacs$$H</linktohtml><link.rule.ids>314,780,784,2765,27076,27924,27925,56738,56788</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=25769154$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Ingham, Bridget</creatorcontrib><creatorcontrib>Gaston, Nicola</creatorcontrib><creatorcontrib>Fahy, Kieran</creatorcontrib><creatorcontrib>Chin, Xiao Yao</creatorcontrib><creatorcontrib>Dotzler, Christian J</creatorcontrib><creatorcontrib>Rees, Eric</creatorcontrib><creatorcontrib>Haslam, Gareth</creatorcontrib><creatorcontrib>Barber, Zoe H</creatorcontrib><creatorcontrib>Burstein, G. Timothy</creatorcontrib><creatorcontrib>Ryan, Mary P</creatorcontrib><title>Extended X-ray Absorption Fine Structure and X-ray Diffraction Examination of Sputtered Nickel Carbon Binary Thin Films for Fuel Cell Applications</title><title>Journal of physical chemistry. C</title><addtitle>J. Phys. Chem. C</addtitle><description>Extended X-ray absorption fine structure (EXAFS) and X-ray diffraction (XRD) are used to study the structure of sputtered binary nickel carbon alloy films (5–44 atom % Ni) for use as potential electrocatalysts in acidic solutions. Three compositional regions are identified: “low” (5 atom % Ni), where the structure consists mainly of isolated Ni atoms or dimers in a carbon matrix; “medium” (11–24 atom % Ni), where the Ni–Ni nearest-neighbor coordination is increased but there is little longer-range order; and “high” (35–44 atom % Ni), where crystalline Ni3C is formed. This indicates a threshold concentration of Ni of between 25 and 35 at% before Ni3C starts to form.</description><subject>Applied sciences</subject><subject>Cross-disciplinary physics: materials science; rheology</subject><subject>Deposition by sputtering</subject><subject>Direct energy conversion and energy accumulation</subject><subject>Electrical engineering. Electrical power engineering</subject><subject>Electrical power engineering</subject><subject>Electrochemical conversion: primary and secondary batteries, fuel cells</subject><subject>Exact sciences and technology</subject><subject>Materials science</subject><subject>Methods of deposition of films and coatings; film growth and epitaxy</subject><subject>Physics</subject><issn>1932-7447</issn><issn>1932-7455</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2012</creationdate><recordtype>article</recordtype><recordid>eNptkLFOwzAQhi0EEqUw8AZeGBgCduzEyVhKC0gVDC0SW3RxbXBJnchOpPY1eGKcFsrC5F--7z7dHUKXlNxQEtPbVRMTwUj2foQGNGdxJHiSHB8yF6fozPsVIQkjlA3Q12TTKrtUS_wWOdjiUelr17SmtnhqrMLz1nWy7ZzCYH-Ze6O1A7mDJhtYGwu7XGs8b7q2VS7ono38VBUegytD6S4wbosXH6b3VmuPde3wtOsJVVV41DSVkTuNP0cnGiqvLn7eIXqdThbjx2j28vA0Hs0iiLO8jSSnQoqUa5mHD04zlTNIgQlCE8ly3mfCyZKUaS6ylCslgMTAeEl0yjJgQ3S990pXe--ULhpn1mHMgpKiP2ZxOGZgr_ZsA15CFda30vhDQ5yINKcJ_-NA-mJVd86GDf7xfQMFwYEn</recordid><startdate>20120315</startdate><enddate>20120315</enddate><creator>Ingham, Bridget</creator><creator>Gaston, Nicola</creator><creator>Fahy, Kieran</creator><creator>Chin, Xiao Yao</creator><creator>Dotzler, Christian J</creator><creator>Rees, Eric</creator><creator>Haslam, Gareth</creator><creator>Barber, Zoe H</creator><creator>Burstein, G. 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Electrical power engineering</topic><topic>Electrical power engineering</topic><topic>Electrochemical conversion: primary and secondary batteries, fuel cells</topic><topic>Exact sciences and technology</topic><topic>Materials science</topic><topic>Methods of deposition of films and coatings; film growth and epitaxy</topic><topic>Physics</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Ingham, Bridget</creatorcontrib><creatorcontrib>Gaston, Nicola</creatorcontrib><creatorcontrib>Fahy, Kieran</creatorcontrib><creatorcontrib>Chin, Xiao Yao</creatorcontrib><creatorcontrib>Dotzler, Christian J</creatorcontrib><creatorcontrib>Rees, Eric</creatorcontrib><creatorcontrib>Haslam, Gareth</creatorcontrib><creatorcontrib>Barber, Zoe H</creatorcontrib><creatorcontrib>Burstein, G. 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C</addtitle><date>2012-03-15</date><risdate>2012</risdate><volume>116</volume><issue>10</issue><spage>6159</spage><epage>6165</epage><pages>6159-6165</pages><issn>1932-7447</issn><eissn>1932-7455</eissn><abstract>Extended X-ray absorption fine structure (EXAFS) and X-ray diffraction (XRD) are used to study the structure of sputtered binary nickel carbon alloy films (5–44 atom % Ni) for use as potential electrocatalysts in acidic solutions. Three compositional regions are identified: “low” (5 atom % Ni), where the structure consists mainly of isolated Ni atoms or dimers in a carbon matrix; “medium” (11–24 atom % Ni), where the Ni–Ni nearest-neighbor coordination is increased but there is little longer-range order; and “high” (35–44 atom % Ni), where crystalline Ni3C is formed. This indicates a threshold concentration of Ni of between 25 and 35 at% before Ni3C starts to form.</abstract><cop>Columbus, OH</cop><pub>American Chemical Society</pub><doi>10.1021/jp207308g</doi><tpages>7</tpages></addata></record> |
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subjects | Applied sciences Cross-disciplinary physics: materials science rheology Deposition by sputtering Direct energy conversion and energy accumulation Electrical engineering. Electrical power engineering Electrical power engineering Electrochemical conversion: primary and secondary batteries, fuel cells Exact sciences and technology Materials science Methods of deposition of films and coatings film growth and epitaxy Physics |
title | Extended X-ray Absorption Fine Structure and X-ray Diffraction Examination of Sputtered Nickel Carbon Binary Thin Films for Fuel Cell Applications |
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