Thermally Activated Processes at the Co/ZnO Interface Elucidated Using High Energy X-rays

A detailed picture of the thermally activated processes occurring at the Co/ZnO interface is obtained by a combination of high energy X-ray based techniques: X-ray photoelectron and absorption spectroscopies and the kinematical X-ray standing wave method. At room temperature, the growth of a few mon...

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Veröffentlicht in:Journal of physical chemistry. C 2011-04, Vol.115 (15), p.7411-7418
Hauptverfasser: Dumont, Jacques A, Mugumaoderha, Mac C, Ghijsen, Jacques, Thiess, Sebastian, Drube, Wolfgang, Walz, Bente, Tolkiehn, Martin, Novikov, Dmitri, de Groot, Frank M. F, Sporken, Robert
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Sprache:eng
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Zusammenfassung:A detailed picture of the thermally activated processes occurring at the Co/ZnO interface is obtained by a combination of high energy X-ray based techniques: X-ray photoelectron and absorption spectroscopies and the kinematical X-ray standing wave method. At room temperature, the growth of a few monolayers of cobalt proceeds by the nucleation of nanometer-sized clusters on the polar oxygen-terminated (0001̅) surface of a ZnO single crystal. Progressive annealing from 600 to 970 K allows separating the various interfacial reactions. At the lowest annealing temperature, Co clusters coalesce while keeping their metallic character. Above 700 K Co0 is gradually oxidized to Co2+ and a thin Co rich (Zn,Co)O layer is formed. It is observed that rock salt CoO phases may form at the surface when the initial Co thickness exceeds 1 nm. At the highest annealing temperature (970 K), Co diffuses deeper into ZnO and Zn vacancies are created at subsurface sites that were previously occupied by Co.
ISSN:1932-7447
1932-7455
DOI:10.1021/jp108744c