Mechanistic Studies of CVD Metallization Processes:  Reactions of Rhodium and Platinum β-Diketonate Complexes on Copper Surfaces

The hexafluoroacetylacetonate complexes Rh(hfac)(C2H4)2 and Pt(hfac)2 are known to serve as chemical vapor deposition precursors to Rh and Pt thin films. In the absence of a reducing carrier gas, the depositions are surface-selective and occur preferentially on copper, but under these conditions, th...

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Veröffentlicht in:	Journal of the American Chemical Society 2000-04, Vol.122 (14), p.3422-3435
Hauptverfasser:	Crane, Elizabeth L, You, Yujian, Nuzzo, Ralph G, Girolami, Gregory S
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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