Chemisorption of Fluorine, Chlorine, HF, and HCl on the Diamond (100)2x1 Surface: An ab Initio Study

This work addresses mechanistic issues in halogen assisted diamond growth via ab initio molecular orbital calculations on halogenated and hydrohalogenated carbon clusters as models of dimer-reconstructed diamond (100)2x1 surfaces. The bond lengths and the C-X and XCC-H bond energies have been found...

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Veröffentlicht in:Journal of Physical Chemistry 1995-03, Vol.99 (13), p.4710-4719
Hauptverfasser: Hukka, Terttu I, Pakkanen, Tapani A, D'Evelyn, Mark P
Format: Artikel
Sprache:eng
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Zusammenfassung:This work addresses mechanistic issues in halogen assisted diamond growth via ab initio molecular orbital calculations on halogenated and hydrohalogenated carbon clusters as models of dimer-reconstructed diamond (100)2x1 surfaces. The bond lengths and the C-X and XCC-H bond energies have been found along with the effects of lattice constraints. The present results indicate that adsorbed F and Cl should be rather strongly bound to diamond surfaces, at least in the low coverage limit. A comparison of the C-X bond energies with experimental measurements of the stability of adsorbed F and Cl leads to the conclusion that the surface C-X bond strength is greatly reduced at monolayer coverage, due to steric and/or electronic repulsion effects that cannot be adequately included in small cluster models. 60 refs., 3 figs., 8 tabs.
ISSN:0022-3654
1541-5740
DOI:10.1021/j100013a048