Tin Oxide Films Made by Physical Vapor Deposition-Thermal Oxidation and Spray Pyrolysis
Tin oxide films have been prepared by physical vapor deposition of Sn followed by thermal oxidation and by spray pyrolysis of SnCl4 or SnCl4·5H4O mixed with CH3OH. Phase changes and surface morphologies during the syntheses were monitored by X-ray diffraction and scanning electron microscopy. Electr...
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| Veröffentlicht in: | Chemistry of materials 1998-09, Vol.10 (9), p.2389-2398 |
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| container_title | Chemistry of materials |
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| creator | Park, Sang Hyun Son, Young Chan Willis, William S Suib, Steven L Creasy, Kenneth E |
| description | Tin oxide films have been prepared by physical vapor deposition of Sn followed by thermal oxidation and by spray pyrolysis of SnCl4 or SnCl4·5H4O mixed with CH3OH. Phase changes and surface morphologies during the syntheses were monitored by X-ray diffraction and scanning electron microscopy. Electrical resistance and UV−visible transmittance of tin oxide films prepared by both methods were measured. The peak shapes of the Auger Sn M4N45N45 transition of the prepared tin oxide films were compared to those of commercial SnO and SnO2 and used to determine rough values of the oxidation state of Sn. Oxygen/tin ratios in the films were determined from analyses of scanning Auger microprobe and X-ray photoelectron spectroscopy and are all less than 2. Auger depth profiles with thermally oxidized tin oxide films on glass substrates show an overlapping region between the tin oxide film and the substrate. These films were tested as sensors for CH2Cl2 in O2. The mixed phase (SnO·SnO2) tin oxide films prepared by temperature-programmed thermal oxidation of Sn showed better sensing behavior to CH2Cl2 than single phase (SnO or SnO2) films. |
| doi_str_mv | 10.1021/cm970672x |
| format | Article |
| fullrecord | <record><control><sourceid>acs_cross</sourceid><recordid>TN_cdi_crossref_primary_10_1021_cm970672x</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>c218885391</sourcerecordid><originalsourceid>FETCH-LOGICAL-a390t-15ca4cacd2c571f04bbe4ba675e85aab193278c444e295e94ea65a10e9f6eb173</originalsourceid><addsrcrecordid>eNptkD9PwzAQxS0EEqUw8A0ywMAQsB07TkaglIJStVIDjNbFdVSX_JNdpObb4yqoE9Od7n7vTu8hdE3wPcGUPKg6FTgWdH-CRoRTHHKM6Ska4SQVIRM8PkcXzm0xJh5PRugrN02w2Ju1Dqamql0wB98WfbDc9M4oqIJP6FobTHTXOrMzbRPmG21rvzio4DAJoFkHq86CV_W2rbzQXaKzEiqnr_7qGH1MX_LnWZgtXt-eH7MQohTvQsIVMAVqTRUXpMSsKDQrIBZcJxygIGlERaIYY5qmXKdMQ8yBYJ2WsS6IiMbobrirbOuc1aXsrKnB9pJgeUhEHhPx7M3AduC8s9JCo4w7CiijmEXMY-GAGbfT--Ma7LeMRSS4zJcrmc2zp_fphMmZ528HHpST2_bHNt7wP-9_AeDsfBA</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Tin Oxide Films Made by Physical Vapor Deposition-Thermal Oxidation and Spray Pyrolysis</title><source>ACS Publications</source><creator>Park, Sang Hyun ; Son, Young Chan ; Willis, William S ; Suib, Steven L ; Creasy, Kenneth E</creator><creatorcontrib>Park, Sang Hyun ; Son, Young Chan ; Willis, William S ; Suib, Steven L ; Creasy, Kenneth E</creatorcontrib><description>Tin oxide films have been prepared by physical vapor deposition of Sn followed by thermal oxidation and by spray pyrolysis of SnCl4 or SnCl4·5H4O mixed with CH3OH. Phase changes and surface morphologies during the syntheses were monitored by X-ray diffraction and scanning electron microscopy. Electrical resistance and UV−visible transmittance of tin oxide films prepared by both methods were measured. The peak shapes of the Auger Sn M4N45N45 transition of the prepared tin oxide films were compared to those of commercial SnO and SnO2 and used to determine rough values of the oxidation state of Sn. Oxygen/tin ratios in the films were determined from analyses of scanning Auger microprobe and X-ray photoelectron spectroscopy and are all less than 2. Auger depth profiles with thermally oxidized tin oxide films on glass substrates show an overlapping region between the tin oxide film and the substrate. These films were tested as sensors for CH2Cl2 in O2. The mixed phase (SnO·SnO2) tin oxide films prepared by temperature-programmed thermal oxidation of Sn showed better sensing behavior to CH2Cl2 than single phase (SnO or SnO2) films.</description><identifier>ISSN: 0897-4756</identifier><identifier>EISSN: 1520-5002</identifier><identifier>DOI: 10.1021/cm970672x</identifier><language>eng</language><publisher>Washington, DC: American Chemical Society</publisher><subject>Condensed matter: electronic structure, electrical, magnetic, and optical properties ; Cross-disciplinary physics: materials science; rheology ; Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures ; Electronic transport phenomena in thin films and low-dimensional structures ; Exact sciences and technology ; Low-field transport and mobility; piezoresistance ; Materials science ; Methods of deposition of films and coatings; film growth and epitaxy ; Optical constants (including refractive index, complex dielectric constant, absorption, reflection and transmission coefficients, emissivity) ; Optical constants: refractive index, complex dielectric constant, absorption, reflection and transmission coefficients, emissivity ; Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation ; Optical properties of bulk materials and thin films ; Physics ; Vacuum deposition</subject><ispartof>Chemistry of materials, 1998-09, Vol.10 (9), p.2389-2398</ispartof><rights>Copyright © 1998 American Chemical Society</rights><rights>1998 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-a390t-15ca4cacd2c571f04bbe4ba675e85aab193278c444e295e94ea65a10e9f6eb173</citedby><cites>FETCH-LOGICAL-a390t-15ca4cacd2c571f04bbe4ba675e85aab193278c444e295e94ea65a10e9f6eb173</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://pubs.acs.org/doi/pdf/10.1021/cm970672x$$EPDF$$P50$$Gacs$$H</linktopdf><linktohtml>$$Uhttps://pubs.acs.org/doi/10.1021/cm970672x$$EHTML$$P50$$Gacs$$H</linktohtml><link.rule.ids>314,778,782,2754,27063,27911,27912,56725,56775</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=2420434$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Park, Sang Hyun</creatorcontrib><creatorcontrib>Son, Young Chan</creatorcontrib><creatorcontrib>Willis, William S</creatorcontrib><creatorcontrib>Suib, Steven L</creatorcontrib><creatorcontrib>Creasy, Kenneth E</creatorcontrib><title>Tin Oxide Films Made by Physical Vapor Deposition-Thermal Oxidation and Spray Pyrolysis</title><title>Chemistry of materials</title><addtitle>Chem. Mater</addtitle><description>Tin oxide films have been prepared by physical vapor deposition of Sn followed by thermal oxidation and by spray pyrolysis of SnCl4 or SnCl4·5H4O mixed with CH3OH. Phase changes and surface morphologies during the syntheses were monitored by X-ray diffraction and scanning electron microscopy. Electrical resistance and UV−visible transmittance of tin oxide films prepared by both methods were measured. The peak shapes of the Auger Sn M4N45N45 transition of the prepared tin oxide films were compared to those of commercial SnO and SnO2 and used to determine rough values of the oxidation state of Sn. Oxygen/tin ratios in the films were determined from analyses of scanning Auger microprobe and X-ray photoelectron spectroscopy and are all less than 2. Auger depth profiles with thermally oxidized tin oxide films on glass substrates show an overlapping region between the tin oxide film and the substrate. These films were tested as sensors for CH2Cl2 in O2. The mixed phase (SnO·SnO2) tin oxide films prepared by temperature-programmed thermal oxidation of Sn showed better sensing behavior to CH2Cl2 than single phase (SnO or SnO2) films.</description><subject>Condensed matter: electronic structure, electrical, magnetic, and optical properties</subject><subject>Cross-disciplinary physics: materials science; rheology</subject><subject>Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures</subject><subject>Electronic transport phenomena in thin films and low-dimensional structures</subject><subject>Exact sciences and technology</subject><subject>Low-field transport and mobility; piezoresistance</subject><subject>Materials science</subject><subject>Methods of deposition of films and coatings; film growth and epitaxy</subject><subject>Optical constants (including refractive index, complex dielectric constant, absorption, reflection and transmission coefficients, emissivity)</subject><subject>Optical constants: refractive index, complex dielectric constant, absorption, reflection and transmission coefficients, emissivity</subject><subject>Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation</subject><subject>Optical properties of bulk materials and thin films</subject><subject>Physics</subject><subject>Vacuum deposition</subject><issn>0897-4756</issn><issn>1520-5002</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1998</creationdate><recordtype>article</recordtype><recordid>eNptkD9PwzAQxS0EEqUw8A0ywMAQsB07TkaglIJStVIDjNbFdVSX_JNdpObb4yqoE9Od7n7vTu8hdE3wPcGUPKg6FTgWdH-CRoRTHHKM6Ska4SQVIRM8PkcXzm0xJh5PRugrN02w2Ju1Dqamql0wB98WfbDc9M4oqIJP6FobTHTXOrMzbRPmG21rvzio4DAJoFkHq86CV_W2rbzQXaKzEiqnr_7qGH1MX_LnWZgtXt-eH7MQohTvQsIVMAVqTRUXpMSsKDQrIBZcJxygIGlERaIYY5qmXKdMQ8yBYJ2WsS6IiMbobrirbOuc1aXsrKnB9pJgeUhEHhPx7M3AduC8s9JCo4w7CiijmEXMY-GAGbfT--Ma7LeMRSS4zJcrmc2zp_fphMmZ528HHpST2_bHNt7wP-9_AeDsfBA</recordid><startdate>19980921</startdate><enddate>19980921</enddate><creator>Park, Sang Hyun</creator><creator>Son, Young Chan</creator><creator>Willis, William S</creator><creator>Suib, Steven L</creator><creator>Creasy, Kenneth E</creator><general>American Chemical Society</general><scope>BSCLL</scope><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>19980921</creationdate><title>Tin Oxide Films Made by Physical Vapor Deposition-Thermal Oxidation and Spray Pyrolysis</title><author>Park, Sang Hyun ; Son, Young Chan ; Willis, William S ; Suib, Steven L ; Creasy, Kenneth E</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-a390t-15ca4cacd2c571f04bbe4ba675e85aab193278c444e295e94ea65a10e9f6eb173</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1998</creationdate><topic>Condensed matter: electronic structure, electrical, magnetic, and optical properties</topic><topic>Cross-disciplinary physics: materials science; rheology</topic><topic>Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures</topic><topic>Electronic transport phenomena in thin films and low-dimensional structures</topic><topic>Exact sciences and technology</topic><topic>Low-field transport and mobility; piezoresistance</topic><topic>Materials science</topic><topic>Methods of deposition of films and coatings; film growth and epitaxy</topic><topic>Optical constants (including refractive index, complex dielectric constant, absorption, reflection and transmission coefficients, emissivity)</topic><topic>Optical constants: refractive index, complex dielectric constant, absorption, reflection and transmission coefficients, emissivity</topic><topic>Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation</topic><topic>Optical properties of bulk materials and thin films</topic><topic>Physics</topic><topic>Vacuum deposition</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Park, Sang Hyun</creatorcontrib><creatorcontrib>Son, Young Chan</creatorcontrib><creatorcontrib>Willis, William S</creatorcontrib><creatorcontrib>Suib, Steven L</creatorcontrib><creatorcontrib>Creasy, Kenneth E</creatorcontrib><collection>Istex</collection><collection>Pascal-Francis</collection><collection>CrossRef</collection><jtitle>Chemistry of materials</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Park, Sang Hyun</au><au>Son, Young Chan</au><au>Willis, William S</au><au>Suib, Steven L</au><au>Creasy, Kenneth E</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Tin Oxide Films Made by Physical Vapor Deposition-Thermal Oxidation and Spray Pyrolysis</atitle><jtitle>Chemistry of materials</jtitle><addtitle>Chem. Mater</addtitle><date>1998-09-21</date><risdate>1998</risdate><volume>10</volume><issue>9</issue><spage>2389</spage><epage>2398</epage><pages>2389-2398</pages><issn>0897-4756</issn><eissn>1520-5002</eissn><abstract>Tin oxide films have been prepared by physical vapor deposition of Sn followed by thermal oxidation and by spray pyrolysis of SnCl4 or SnCl4·5H4O mixed with CH3OH. Phase changes and surface morphologies during the syntheses were monitored by X-ray diffraction and scanning electron microscopy. Electrical resistance and UV−visible transmittance of tin oxide films prepared by both methods were measured. The peak shapes of the Auger Sn M4N45N45 transition of the prepared tin oxide films were compared to those of commercial SnO and SnO2 and used to determine rough values of the oxidation state of Sn. Oxygen/tin ratios in the films were determined from analyses of scanning Auger microprobe and X-ray photoelectron spectroscopy and are all less than 2. Auger depth profiles with thermally oxidized tin oxide films on glass substrates show an overlapping region between the tin oxide film and the substrate. These films were tested as sensors for CH2Cl2 in O2. The mixed phase (SnO·SnO2) tin oxide films prepared by temperature-programmed thermal oxidation of Sn showed better sensing behavior to CH2Cl2 than single phase (SnO or SnO2) films.</abstract><cop>Washington, DC</cop><pub>American Chemical Society</pub><doi>10.1021/cm970672x</doi><tpages>10</tpages></addata></record> |
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| source | ACS Publications |
| subjects | Condensed matter: electronic structure, electrical, magnetic, and optical properties Cross-disciplinary physics: materials science rheology Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures Electronic transport phenomena in thin films and low-dimensional structures Exact sciences and technology Low-field transport and mobility piezoresistance Materials science Methods of deposition of films and coatings film growth and epitaxy Optical constants (including refractive index, complex dielectric constant, absorption, reflection and transmission coefficients, emissivity) Optical constants: refractive index, complex dielectric constant, absorption, reflection and transmission coefficients, emissivity Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation Optical properties of bulk materials and thin films Physics Vacuum deposition |
| title | Tin Oxide Films Made by Physical Vapor Deposition-Thermal Oxidation and Spray Pyrolysis |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-16T01%3A14%3A06IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-acs_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Tin%20Oxide%20Films%20Made%20by%20Physical%20Vapor%20Deposition-Thermal%20Oxidation%20and%20Spray%20Pyrolysis&rft.jtitle=Chemistry%20of%20materials&rft.au=Park,%20Sang%20Hyun&rft.date=1998-09-21&rft.volume=10&rft.issue=9&rft.spage=2389&rft.epage=2398&rft.pages=2389-2398&rft.issn=0897-4756&rft.eissn=1520-5002&rft_id=info:doi/10.1021/cm970672x&rft_dat=%3Cacs_cross%3Ec218885391%3C/acs_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |