Benzoylpivaloylmethanide Precursors for the Chemical Beam Epitaxy of Oxide Thin Films. 1. Synthesis, Characterization, and Use of Yttrium Benzoylpivaloylmethanide

The new complex yttrium benzoylpivaloylmethanide and its acetonitrile adduct have been characterized by IR, NMR, mass spectroscopy, X-ray structure analysis, and thermogravimetric/differential thermal analysis. In situ flux measurements and mass spectroscopic studies have been performed to test the...

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Veröffentlicht in:Chemistry of materials 1997-01, Vol.9 (1), p.127-134
Hauptverfasser: Fritsch, E, Mächler, E, Arrouy, F, Orama, O, Berke, H, Povey, I, Willmott, P. R, Locquet, J.-P
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container_end_page 134
container_issue 1
container_start_page 127
container_title Chemistry of materials
container_volume 9
creator Fritsch, E
Mächler, E
Arrouy, F
Orama, O
Berke, H
Povey, I
Willmott, P. R
Locquet, J.-P
description The new complex yttrium benzoylpivaloylmethanide and its acetonitrile adduct have been characterized by IR, NMR, mass spectroscopy, X-ray structure analysis, and thermogravimetric/differential thermal analysis. In situ flux measurements and mass spectroscopic studies have been performed to test the suitability of this compound as a precursor for the deposition of complex oxide thin films under molecular beam conditions. Finally it has been used to deposit epitaxial Y2O3 (001) thin films on SrTiO3 (001) substrates.
doi_str_mv 10.1021/cm9602510
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subjects Applied sciences
Exact sciences and technology
Organic polymers
Physicochemistry of polymers
Properties and characterization
Surface properties
title Benzoylpivaloylmethanide Precursors for the Chemical Beam Epitaxy of Oxide Thin Films. 1. Synthesis, Characterization, and Use of Yttrium Benzoylpivaloylmethanide
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