Benzoylpivaloylmethanide Precursors for the Chemical Beam Epitaxy of Oxide Thin Films. 1. Synthesis, Characterization, and Use of Yttrium Benzoylpivaloylmethanide
The new complex yttrium benzoylpivaloylmethanide and its acetonitrile adduct have been characterized by IR, NMR, mass spectroscopy, X-ray structure analysis, and thermogravimetric/differential thermal analysis. In situ flux measurements and mass spectroscopic studies have been performed to test the...
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Veröffentlicht in: | Chemistry of materials 1997-01, Vol.9 (1), p.127-134 |
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creator | Fritsch, E Mächler, E Arrouy, F Orama, O Berke, H Povey, I Willmott, P. R Locquet, J.-P |
description | The new complex yttrium benzoylpivaloylmethanide and its acetonitrile adduct have been characterized by IR, NMR, mass spectroscopy, X-ray structure analysis, and thermogravimetric/differential thermal analysis. In situ flux measurements and mass spectroscopic studies have been performed to test the suitability of this compound as a precursor for the deposition of complex oxide thin films under molecular beam conditions. Finally it has been used to deposit epitaxial Y2O3 (001) thin films on SrTiO3 (001) substrates. |
doi_str_mv | 10.1021/cm9602510 |
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fullrecord | <record><control><sourceid>istex_cross</sourceid><recordid>TN_cdi_crossref_primary_10_1021_cm9602510</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>ark_67375_TPS_JPVBK24V_J</sourcerecordid><originalsourceid>FETCH-LOGICAL-a324t-c915a19497e4d7fe3695545cd134840b88a8676b58cb3b5bf8474aad2b82ba1c3</originalsourceid><addsrcrecordid>eNp1kMtOGzEUhq2qSE1pF30DL2CBxATbY489SxJxRyISAakr64zHoxjmEtkOSnicPimOgrKiq7M433cuP0J_KBlTwuiZ6cqCMEHJNzSigpFMEMK-oxFRpcy4FMUP9DOEF0JowtUI_ZvY_n3YtEv3Bm2qnY0L6F1t8cxbs_Jh8AE3g8dxYfF0YTtnoMUTCx2-WLoI6w0eGvyw3hrzhevxpWu7MMZ0jB83fZKCC6dJBA8mWu_eIbqhP8XQ1_gp2K38N0bvVh3-3yW_0EEDbbC_P-sherq8mE-vs_uHq5vp-X0GOeMxMyUVQEteSstr2di8KIXgwtQ054qTSilQhSwqoUyVV6JqFJccoGaVYhVQkx-ik91c44cQvG300rsO_EZTorfh6n24iT3asUsIKZDGQ29c2AtMCFqWMmHZDnMh2vW-Df5VFzKXQs9nj_p29jy5Y_xZ3yb-eMeDCfplWPk-PfzF-g9pb5cf</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Benzoylpivaloylmethanide Precursors for the Chemical Beam Epitaxy of Oxide Thin Films. 1. Synthesis, Characterization, and Use of Yttrium Benzoylpivaloylmethanide</title><source>American Chemical Society Journals</source><creator>Fritsch, E ; Mächler, E ; Arrouy, F ; Orama, O ; Berke, H ; Povey, I ; Willmott, P. R ; Locquet, J.-P</creator><creatorcontrib>Fritsch, E ; Mächler, E ; Arrouy, F ; Orama, O ; Berke, H ; Povey, I ; Willmott, P. R ; Locquet, J.-P</creatorcontrib><description>The new complex yttrium benzoylpivaloylmethanide and its acetonitrile adduct have been characterized by IR, NMR, mass spectroscopy, X-ray structure analysis, and thermogravimetric/differential thermal analysis. In situ flux measurements and mass spectroscopic studies have been performed to test the suitability of this compound as a precursor for the deposition of complex oxide thin films under molecular beam conditions. Finally it has been used to deposit epitaxial Y2O3 (001) thin films on SrTiO3 (001) substrates.</description><identifier>ISSN: 0897-4756</identifier><identifier>EISSN: 1520-5002</identifier><identifier>DOI: 10.1021/cm9602510</identifier><language>eng</language><publisher>Washington, DC: American Chemical Society</publisher><subject>Applied sciences ; Exact sciences and technology ; Organic polymers ; Physicochemistry of polymers ; Properties and characterization ; Surface properties</subject><ispartof>Chemistry of materials, 1997-01, Vol.9 (1), p.127-134</ispartof><rights>Copyright © 1997 American Chemical Society</rights><rights>1997 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-a324t-c915a19497e4d7fe3695545cd134840b88a8676b58cb3b5bf8474aad2b82ba1c3</citedby><cites>FETCH-LOGICAL-a324t-c915a19497e4d7fe3695545cd134840b88a8676b58cb3b5bf8474aad2b82ba1c3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://pubs.acs.org/doi/pdf/10.1021/cm9602510$$EPDF$$P50$$Gacs$$H</linktopdf><linktohtml>$$Uhttps://pubs.acs.org/doi/10.1021/cm9602510$$EHTML$$P50$$Gacs$$H</linktohtml><link.rule.ids>314,780,784,2765,27076,27924,27925,56738,56788</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=2551997$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Fritsch, E</creatorcontrib><creatorcontrib>Mächler, E</creatorcontrib><creatorcontrib>Arrouy, F</creatorcontrib><creatorcontrib>Orama, O</creatorcontrib><creatorcontrib>Berke, H</creatorcontrib><creatorcontrib>Povey, I</creatorcontrib><creatorcontrib>Willmott, P. R</creatorcontrib><creatorcontrib>Locquet, J.-P</creatorcontrib><title>Benzoylpivaloylmethanide Precursors for the Chemical Beam Epitaxy of Oxide Thin Films. 1. Synthesis, Characterization, and Use of Yttrium Benzoylpivaloylmethanide</title><title>Chemistry of materials</title><addtitle>Chem. Mater</addtitle><description>The new complex yttrium benzoylpivaloylmethanide and its acetonitrile adduct have been characterized by IR, NMR, mass spectroscopy, X-ray structure analysis, and thermogravimetric/differential thermal analysis. In situ flux measurements and mass spectroscopic studies have been performed to test the suitability of this compound as a precursor for the deposition of complex oxide thin films under molecular beam conditions. Finally it has been used to deposit epitaxial Y2O3 (001) thin films on SrTiO3 (001) substrates.</description><subject>Applied sciences</subject><subject>Exact sciences and technology</subject><subject>Organic polymers</subject><subject>Physicochemistry of polymers</subject><subject>Properties and characterization</subject><subject>Surface properties</subject><issn>0897-4756</issn><issn>1520-5002</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1997</creationdate><recordtype>article</recordtype><recordid>eNp1kMtOGzEUhq2qSE1pF30DL2CBxATbY489SxJxRyISAakr64zHoxjmEtkOSnicPimOgrKiq7M433cuP0J_KBlTwuiZ6cqCMEHJNzSigpFMEMK-oxFRpcy4FMUP9DOEF0JowtUI_ZvY_n3YtEv3Bm2qnY0L6F1t8cxbs_Jh8AE3g8dxYfF0YTtnoMUTCx2-WLoI6w0eGvyw3hrzhevxpWu7MMZ0jB83fZKCC6dJBA8mWu_eIbqhP8XQ1_gp2K38N0bvVh3-3yW_0EEDbbC_P-sherq8mE-vs_uHq5vp-X0GOeMxMyUVQEteSstr2di8KIXgwtQ054qTSilQhSwqoUyVV6JqFJccoGaVYhVQkx-ik91c44cQvG300rsO_EZTorfh6n24iT3asUsIKZDGQ29c2AtMCFqWMmHZDnMh2vW-Df5VFzKXQs9nj_p29jy5Y_xZ3yb-eMeDCfplWPk-PfzF-g9pb5cf</recordid><startdate>19970101</startdate><enddate>19970101</enddate><creator>Fritsch, E</creator><creator>Mächler, E</creator><creator>Arrouy, F</creator><creator>Orama, O</creator><creator>Berke, H</creator><creator>Povey, I</creator><creator>Willmott, P. R</creator><creator>Locquet, J.-P</creator><general>American Chemical Society</general><scope>BSCLL</scope><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>19970101</creationdate><title>Benzoylpivaloylmethanide Precursors for the Chemical Beam Epitaxy of Oxide Thin Films. 1. Synthesis, Characterization, and Use of Yttrium Benzoylpivaloylmethanide</title><author>Fritsch, E ; Mächler, E ; Arrouy, F ; Orama, O ; Berke, H ; Povey, I ; Willmott, P. R ; Locquet, J.-P</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-a324t-c915a19497e4d7fe3695545cd134840b88a8676b58cb3b5bf8474aad2b82ba1c3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1997</creationdate><topic>Applied sciences</topic><topic>Exact sciences and technology</topic><topic>Organic polymers</topic><topic>Physicochemistry of polymers</topic><topic>Properties and characterization</topic><topic>Surface properties</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Fritsch, E</creatorcontrib><creatorcontrib>Mächler, E</creatorcontrib><creatorcontrib>Arrouy, F</creatorcontrib><creatorcontrib>Orama, O</creatorcontrib><creatorcontrib>Berke, H</creatorcontrib><creatorcontrib>Povey, I</creatorcontrib><creatorcontrib>Willmott, P. R</creatorcontrib><creatorcontrib>Locquet, J.-P</creatorcontrib><collection>Istex</collection><collection>Pascal-Francis</collection><collection>CrossRef</collection><jtitle>Chemistry of materials</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Fritsch, E</au><au>Mächler, E</au><au>Arrouy, F</au><au>Orama, O</au><au>Berke, H</au><au>Povey, I</au><au>Willmott, P. R</au><au>Locquet, J.-P</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Benzoylpivaloylmethanide Precursors for the Chemical Beam Epitaxy of Oxide Thin Films. 1. Synthesis, Characterization, and Use of Yttrium Benzoylpivaloylmethanide</atitle><jtitle>Chemistry of materials</jtitle><addtitle>Chem. Mater</addtitle><date>1997-01-01</date><risdate>1997</risdate><volume>9</volume><issue>1</issue><spage>127</spage><epage>134</epage><pages>127-134</pages><issn>0897-4756</issn><eissn>1520-5002</eissn><abstract>The new complex yttrium benzoylpivaloylmethanide and its acetonitrile adduct have been characterized by IR, NMR, mass spectroscopy, X-ray structure analysis, and thermogravimetric/differential thermal analysis. In situ flux measurements and mass spectroscopic studies have been performed to test the suitability of this compound as a precursor for the deposition of complex oxide thin films under molecular beam conditions. Finally it has been used to deposit epitaxial Y2O3 (001) thin films on SrTiO3 (001) substrates.</abstract><cop>Washington, DC</cop><pub>American Chemical Society</pub><doi>10.1021/cm9602510</doi><tpages>8</tpages></addata></record> |
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subjects | Applied sciences Exact sciences and technology Organic polymers Physicochemistry of polymers Properties and characterization Surface properties |
title | Benzoylpivaloylmethanide Precursors for the Chemical Beam Epitaxy of Oxide Thin Films. 1. Synthesis, Characterization, and Use of Yttrium Benzoylpivaloylmethanide |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-24T14%3A44%3A34IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-istex_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Benzoylpivaloylmethanide%20Precursors%20for%20the%20Chemical%20Beam%20Epitaxy%20of%20Oxide%20Thin%20Films.%201.%20Synthesis,%20Characterization,%20and%20Use%20of%20Yttrium%20Benzoylpivaloylmethanide&rft.jtitle=Chemistry%20of%20materials&rft.au=Fritsch,%20E&rft.date=1997-01-01&rft.volume=9&rft.issue=1&rft.spage=127&rft.epage=134&rft.pages=127-134&rft.issn=0897-4756&rft.eissn=1520-5002&rft_id=info:doi/10.1021/cm9602510&rft_dat=%3Cistex_cross%3Eark_67375_TPS_JPVBK24V_J%3C/istex_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |