Phase Formation and Morphology of Nickel Silicide Thin Films Synthesized by Catalyzed Chemical Vapor Reaction of Nickel with Silane

The synthesis of nickel silicide thin films via a vapor–solid reaction has been studied by exposing thin (10 nm) Ni films to silane (SiH4). The crystalline phases, the Ni/Si stoichiometric ratios, as well as the surface and interface properties of the resulting silicide films were investigated as a...

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Veröffentlicht in:	Chemistry of materials 2015-01, Vol.27 (1), p.245-254
Hauptverfasser:	Peter, Antony Premkumar, Meersschaut, Johan, Richard, Olivier, Moussa, Alain, Steenbergen, Johnny, Schaekers, Marc, Tőkei, Zsolt, Van Elshocht, Sven, Adelmann, Christoph
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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