Tantalum and Titanium doped In 2 O 3 Thin Films by Aerosol-Assisted Chemical Vapor Deposition and their Gas Sensing Properties

Tantalum and Titanium doped In 2 O 3 Thin Films by Aerosol-Assisted Chemical Vapor Deposition and their Gas Sensing Properties

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Veröffentlicht in:Chemistry of materials 2012-08, Vol.24 (15), p.2864-2871
Hauptverfasser: Bloor, Leanne G., Manzi, Joe, Binions, Russell, Parkin, Ivan P., Pugh, David, Afonja, Ayo, Blackman, Christopher S., Sathasivam, Sanjayan, Carmalt, Claire J.
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container_end_page 2871
container_issue 15
container_start_page 2864
container_title Chemistry of materials
container_volume 24
creator Bloor, Leanne G.
Manzi, Joe
Binions, Russell
Parkin, Ivan P.
Pugh, David
Afonja, Ayo
Blackman, Christopher S.
Sathasivam, Sanjayan
Carmalt, Claire J.
description
doi_str_mv 10.1021/cm300596c
format Article
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title Tantalum and Titanium doped In 2 O 3 Thin Films by Aerosol-Assisted Chemical Vapor Deposition and their Gas Sensing Properties
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