Plasma-Enhanced Chemical Vapor Deposited Phosphorus Sulfide Films. Characterization by Raman and Solid-State NMR Spectroscopies and Comparison to Melt-Quenched Glassy Materials

Bibliographische Detailangaben

Veröffentlicht in:	Chemistry of materials 1995-09, Vol.7 (9), p.1631-1638
Hauptverfasser:	Shibao, R. K, Xia, Y, Srdanov, V. I, Eckert, H
Format:	Artikel
Sprache:	eng
Schlagworte:	Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) Cross-disciplinary physics: materials science rheology Exact sciences and technology Materials science Methods of deposition of films and coatings film growth and epitaxy Physics
Online-Zugang:	Volltext
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