$Uncertainty Estimation and Design Optimization of 2D Diffraction-Based Overlay Metrology Targets$

Uncertainty Estimation and Design Optimization of 2D Diffraction-Based Overlay Metrology Targets

Scatterometry is an optical metrology technique in which light scattered from a specifically designed grating stack (overlay target) is measured in the far-field. Using 1D periodic overlay target designs, the technique has been shown to have nanometer-scale sensitivity to spatial misalignments of su...

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Veröffentlicht in:	ACS photonics 2020-10, Vol.7 (10), p.2765-2777
Hauptverfasser:	Röhrich, Ruslan, Oliveri, Giorgio, Kovaios, Stefanos, Tenner, Vasco T, den Boef, Arie J, Overvelde, Johannes T. B, Koenderink, A. Femius
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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