Microdisk-Type Multicolor Semipolar Nitride-Based Light-Emitting Diodes

Recently, III-nitride semiconductors have gained immense attention for application in high-performance optoelectronic devices. However, in the device fabrication process, it is essential to develop a wet-etching process for conventional polar nitride-based devices to reduce the dry-etching damage. I...

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Veröffentlicht in:ACS applied nano materials 2022-07, Vol.5 (7), p.9334-9343
Hauptverfasser: Kim, Hee-Wung, Na, Young-Chae, Park, Jiyeon, Lee, Sung-Nam
Format: Artikel
Sprache:eng
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