Surface Diffusion Control Enables Tailored-Aspect-Ratio Nanostructures in Area-Selective Atomic Layer Deposition

Area-selective atomic layer deposition is a key technology for modern microelectronics as it eliminates alignment errors inherent to conventional approaches by enabling material deposition only in specific areas. Typically, the selectivity originates from surface modifications of the substrate that...

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Veröffentlicht in:	ACS applied materials & interfaces 2021-04, Vol.13 (16), p.19398-19405
Hauptverfasser:	Klement, Philip, Anders, Daniel, Gümbel, Lukas, Bastianello, Michele, Michel, Fabian, Schörmann, Jörg, Elm, Matthias T, Heiliger, Christian, Chatterjee, Sangam
Format:	Artikel
Sprache:	eng
Schlagworte:	Surfaces, Interfaces, and Applications
Online-Zugang:	Volltext
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