Low-Temperature Screen-Printed Metallization for the Scale-Up of Two-Terminal Perovskite–Silicon Tandems

Tandem photovoltaic devices based on perovskite and crystalline silicon (PK/c-Si) absorbers have the potential to push commercial silicon single junction devices beyond their current efficiency limit. However, their scale-up to industrially relevant sizes is largely limited by current fabrication me...

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Veröffentlicht in:ACS applied energy materials 2019-05, Vol.2 (5), p.3815-3821
Hauptverfasser: Kamino, Brett A, Paviet-Salomon, Bertrand, Moon, Soo-Jin, Badel, Nicolas, Levrat, Jacques, Christmann, Gabriel, Walter, Arnaud, Faes, Antonin, Ding, Laura, Diaz Leon, Juan J, Paracchino, Adriana, Despeisse, Matthieu, Ballif, Christophe, Nicolay, Sylvain
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Sprache:eng
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Zusammenfassung:Tandem photovoltaic devices based on perovskite and crystalline silicon (PK/c-Si) absorbers have the potential to push commercial silicon single junction devices beyond their current efficiency limit. However, their scale-up to industrially relevant sizes is largely limited by current fabrication methods which rely on evaporated metallization of the front contact instead of industry standard screen-printed silver grids. To tackle this challenge, we demonstrate how a low-temperature silver paste applied by a screen-printing process can be used for the front metal grid of two-terminal perovskite–silicon tandem structures. Small-area tandem devices with such printed front metallization show minimal thermal degradation when annealed up to 140 °C in air, resulting in silver bulk resistivity of
ISSN:2574-0962
2574-0962
DOI:10.1021/acsaem.9b00502