Band Gap Engineering with Ultralarge Biaxial Strains in Suspended Monolayer MoS 2

Band Gap Engineering with Ultralarge Biaxial Strains in Suspended Monolayer MoS 2

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Veröffentlicht in:Nano letters 2016-09, Vol.16 (9), p.5836-5841
Hauptverfasser: Lloyd, David, Liu, Xinghui, Christopher, Jason W., Cantley, Lauren, Wadehra, Anubhav, Kim, Brian L., Goldberg, Bennett B., Swan, Anna K., Bunch, J. Scott
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container_end_page 5841
container_issue 9
container_start_page 5836
container_title Nano letters
container_volume 16
creator Lloyd, David
Liu, Xinghui
Christopher, Jason W.
Cantley, Lauren
Wadehra, Anubhav
Kim, Brian L.
Goldberg, Bennett B.
Swan, Anna K.
Bunch, J. Scott
description
doi_str_mv 10.1021/acs.nanolett.6b02615
format Article
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title Band Gap Engineering with Ultralarge Biaxial Strains in Suspended Monolayer MoS 2
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