Effects of Valence Electron Layer Thickness of Metal Clusters on Electron–Hole Separation at the Metal/TiO 2 Interface

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Journal of physical chemistry. C 2024-11, Vol.128 (46), p.19938-19944
Hauptverfasser: Yan, Xiaodan, Han, Xiao, He, Jinlu
Format: Artikel
Sprache:eng
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page 19944
container_issue 46
container_start_page 19938
container_title Journal of physical chemistry. C
container_volume 128
creator Yan, Xiaodan
Han, Xiao
He, Jinlu
description
doi_str_mv 10.1021/acs.jpcc.4c06428
format Article
fullrecord <record><control><sourceid>crossref</sourceid><recordid>TN_cdi_crossref_primary_10_1021_acs_jpcc_4c06428</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>10_1021_acs_jpcc_4c06428</sourcerecordid><originalsourceid>FETCH-crossref_primary_10_1021_acs_jpcc_4c064283</originalsourceid><addsrcrecordid>eNqdj01KA0EQhRsxYDTuXdYFMumeH6PrMBJBceHgtimKajKx7Rm6WjA77-ANPYkdDTmAqyree9_iU-rK6MLo0iyQpNiOREVN-roub07U1NxW5XxZN83p8a-XZ-pcZKt1U2lTTdVH6xxTEhgcvKDnQAytz0kcAjzgjiN0m55eA8vv5pETelj5d0kccxKO6-_Pr_XgGZ55xIipzxUmSBv-YxZd_wQl3IfMOSSeqYlDL3x5uBdK37Xdaj2nOIhEdnaM_RvGnTXa7g1tNrR7Q3swrP6B_ABW5V4m</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Effects of Valence Electron Layer Thickness of Metal Clusters on Electron–Hole Separation at the Metal/TiO 2 Interface</title><source>American Chemical Society Journals</source><creator>Yan, Xiaodan ; Han, Xiao ; He, Jinlu</creator><creatorcontrib>Yan, Xiaodan ; Han, Xiao ; He, Jinlu</creatorcontrib><identifier>ISSN: 1932-7447</identifier><identifier>EISSN: 1932-7455</identifier><identifier>DOI: 10.1021/acs.jpcc.4c06428</identifier><language>eng</language><ispartof>Journal of physical chemistry. C, 2024-11, Vol.128 (46), p.19938-19944</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><cites>FETCH-crossref_primary_10_1021_acs_jpcc_4c064283</cites><orcidid>0000-0001-9772-8572</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,2765,27924,27925</link.rule.ids></links><search><creatorcontrib>Yan, Xiaodan</creatorcontrib><creatorcontrib>Han, Xiao</creatorcontrib><creatorcontrib>He, Jinlu</creatorcontrib><title>Effects of Valence Electron Layer Thickness of Metal Clusters on Electron–Hole Separation at the Metal/TiO 2 Interface</title><title>Journal of physical chemistry. C</title><issn>1932-7447</issn><issn>1932-7455</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2024</creationdate><recordtype>article</recordtype><recordid>eNqdj01KA0EQhRsxYDTuXdYFMumeH6PrMBJBceHgtimKajKx7Rm6WjA77-ANPYkdDTmAqyree9_iU-rK6MLo0iyQpNiOREVN-roub07U1NxW5XxZN83p8a-XZ-pcZKt1U2lTTdVH6xxTEhgcvKDnQAytz0kcAjzgjiN0m55eA8vv5pETelj5d0kccxKO6-_Pr_XgGZ55xIipzxUmSBv-YxZd_wQl3IfMOSSeqYlDL3x5uBdK37Xdaj2nOIhEdnaM_RvGnTXa7g1tNrR7Q3swrP6B_ABW5V4m</recordid><startdate>20241121</startdate><enddate>20241121</enddate><creator>Yan, Xiaodan</creator><creator>Han, Xiao</creator><creator>He, Jinlu</creator><scope>AAYXX</scope><scope>CITATION</scope><orcidid>https://orcid.org/0000-0001-9772-8572</orcidid></search><sort><creationdate>20241121</creationdate><title>Effects of Valence Electron Layer Thickness of Metal Clusters on Electron–Hole Separation at the Metal/TiO 2 Interface</title><author>Yan, Xiaodan ; Han, Xiao ; He, Jinlu</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-crossref_primary_10_1021_acs_jpcc_4c064283</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2024</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Yan, Xiaodan</creatorcontrib><creatorcontrib>Han, Xiao</creatorcontrib><creatorcontrib>He, Jinlu</creatorcontrib><collection>CrossRef</collection><jtitle>Journal of physical chemistry. C</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Yan, Xiaodan</au><au>Han, Xiao</au><au>He, Jinlu</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Effects of Valence Electron Layer Thickness of Metal Clusters on Electron–Hole Separation at the Metal/TiO 2 Interface</atitle><jtitle>Journal of physical chemistry. C</jtitle><date>2024-11-21</date><risdate>2024</risdate><volume>128</volume><issue>46</issue><spage>19938</spage><epage>19944</epage><pages>19938-19944</pages><issn>1932-7447</issn><eissn>1932-7455</eissn><doi>10.1021/acs.jpcc.4c06428</doi><orcidid>https://orcid.org/0000-0001-9772-8572</orcidid></addata></record>
fulltext fulltext
identifier ISSN: 1932-7447
ispartof Journal of physical chemistry. C, 2024-11, Vol.128 (46), p.19938-19944
issn 1932-7447
1932-7455
language eng
recordid cdi_crossref_primary_10_1021_acs_jpcc_4c06428
source American Chemical Society Journals
title Effects of Valence Electron Layer Thickness of Metal Clusters on Electron–Hole Separation at the Metal/TiO 2 Interface
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-27T06%3A46%3A02IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-crossref&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Effects%20of%20Valence%20Electron%20Layer%20Thickness%20of%20Metal%20Clusters%20on%20Electron%E2%80%93Hole%20Separation%20at%20the%20Metal/TiO%202%20Interface&rft.jtitle=Journal%20of%20physical%20chemistry.%20C&rft.au=Yan,%20Xiaodan&rft.date=2024-11-21&rft.volume=128&rft.issue=46&rft.spage=19938&rft.epage=19944&rft.pages=19938-19944&rft.issn=1932-7447&rft.eissn=1932-7455&rft_id=info:doi/10.1021/acs.jpcc.4c06428&rft_dat=%3Ccrossref%3E10_1021_acs_jpcc_4c06428%3C/crossref%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true