The Role of Strong Coupling in the Process of Photobleaching Suppression

We theoretically study the role of strong coupling between an organic J-aggregated chromophore and a plasmonic nanostructure in the process of photobleaching suppression. We take into account the influence of vibrational degrees of freedom of nuclei in the molecules of J-aggregates in the Born–Markov approximation. We then show that in the strong coupling regime in this system, the stability of the J-aggregated chromophore increases by an order of magnitude. We also show that there is an optimal value of red detuning between the plasmon resonance frequency and the frequency of the dipole transition in the J-aggregate, for which the photobleaching suppression is most pronounced. We find this optimal value at different Rabi frequencies. Our results clarify the role of strong coupling between a plasmon structure near field and a molecular dipole moment in the process of photobleaching suppression and they pave the way for control of a chemical reaction in the vicinity of a plasmonic nanostructure.