Plasma-Enhanced Atomic Layer Deposition of Cobalt and Cobalt Nitride: What Controls the Incorporation of Nitrogen?

The present study covers the processes that govern the incorporation of nitrogen in the film during atomic layer deposition (ALD) of cobalt and cobalt nitride prepared from cobaltocene (CoCp2) and NH3 plasma. It is demonstrated that nitrogen incorporation is strongly temperature-dependent; at temper...

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Veröffentlicht in:	Journal of physical chemistry. C 2020-10, Vol.124 (40), p.22046-22054
Hauptverfasser:	van Straaten, Gerben, Deckers, Rick, Vos, Martijn F. J, Kessels, Wilhelmus M. M, Creatore, Mariadriana
Format:	Artikel
Sprache:	eng
Schlagworte:	C: Surfaces, Interfaces, Porous Materials, and Catalysis Chemistry Chemistry, Physical Materials Science Materials Science, Multidisciplinary Nanoscience & Nanotechnology Physical Sciences Science & Technology Science & Technology - Other Topics Technology
Online-Zugang:	Volltext
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