Numerical Simulation of an Entire Wafer Surface during Ozone-Based Wet Chemical Etching

In microelectromechanical system manufacturing and especially in the photovoltaic industry, wet-chemical baths are used for surface structuring, conditioning, and cleaning. Ozone-based wet-chemical cleaning processes show, in addition to the cleaning of the silicon wafers, the ancillary effect of in...

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Veröffentlicht in:	Industrial & engineering chemistry research 2020-10, Vol.59 (40), p.17680-17688
Hauptverfasser:	Mohr, Lena, Dannenberg, Tobias, Moldovan, Anamaria, Zimmer, Martin, Müller, Claas
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied Chemistry
Online-Zugang:	Volltext
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