Unveiled Understanding on Thermodynamic Mechanisms of Atomic Layer Deposition Based on Trimethylaluminum and Water Precursors

Despite the importance of the atomic layer deposition (ALD) technique for developing thin films of various inorganic materials with the precisely controlled thickness, the detailed mechanistic pathway and thermodynamics of the ALD processes are not fully understood. In this study, the first-principl...

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Veröffentlicht in:	Industrial & engineering chemistry research 2020-07, Vol.59 (29), p.13325-13332
Hauptverfasser:	Choi, Jae Won, Ham, So-Yeon, Lee, Suhyun, Shin, Da-Som, Min, Yo-Sep, Kim, Ki Chul
Format:	Artikel
Sprache:	eng
Schlagworte:	Thermodynamics, Transport, and Fluid Mechanics
Online-Zugang:	Volltext
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