XAS studies of vanadium pentoxide thin films

Thin films of 200 nm of VOx RF magnetron sputtered on the SiO2 glass and Si substrates were studied with X-ray Absorption Spectroscopy in the XANES range of the oxygen K and vanadium L2,3 edges. The total electron yield (TEY) detection mode was used. The spectra were collected at several temperature...

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Veröffentlicht in:Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms Beam interactions with materials and atoms, 2023-12, Vol.545, p.165148, Article 165148
Hauptverfasser: Schneider, K., Nowak, P., Strączek, T., Raszka, K., Figura, A., Stępień, J., Rękas, M., Kapusta, Cz
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Sprache:eng
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Zusammenfassung:Thin films of 200 nm of VOx RF magnetron sputtered on the SiO2 glass and Si substrates were studied with X-ray Absorption Spectroscopy in the XANES range of the oxygen K and vanadium L2,3 edges. The total electron yield (TEY) detection mode was used. The spectra were collected at several temperatures between room temperature and 300 °C for the unpolarized and linearly polarized beam to study polarization effects. The experimental data were compared with the theoretical model based on DFT-ROCIS (Density Functional Theory, Restricted Open shell Configuration Interaction with Singles) from the literature. Changes in the spectra with temperature, particularly visible at the oxygen K edge are attributed to the loss of surface oxygen and the corresponding changes of population of the single- double- and triple vanadium coordinated oxygen. The corresponding decrease of the surface stoichiometry leads to formation lower than V5+ valency of vanadium ions such as V4+ or V3+ i.e., containing d-electrons. It gives a tentative explanation for the occurrence of metallicity attributed in the literature to a metal–insulator transition (MIT).
ISSN:0168-583X
1872-9584
DOI:10.1016/j.nimb.2023.165148