Singular Sheet Etching of Graphene with Oxygen Plasma

This paper reports a simple and controllable post-synthesis method for engineering the number of graphene layers based on oxygen plasma etching. Singular sheet etching(SSE) of graphene was achieved with the optimum process duration of 38 seconds. As a demonstration of this SSE process, monolayer gra...

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Veröffentlicht in:	Nano-micro letters 2014-04, Vol.6 (2), p.116-124
Hauptverfasser:	Al-Mumen, Haider, Rao, Fubo, Li, Wen, Dong, Lixin
Format:	Artikel
Sprache:	eng
Schlagworte:	Engineering Nanoscale Science and Technology Nanotechnology Nanotechnology and Microengineering
Online-Zugang:	Volltext
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