Effects of 50 keV2H+-ion implantation and rapid thermal annealing on the microstructure of YBCO thin films

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Veröffentlicht in:	Journal of materials science 1995-12, Vol.30 (23), p.5927-5930
Hauptverfasser:	Li, Y. H., Leach, C., Tate, T. J., Lee, M. J., Li, Yupu, Kilner, J. A., Quincey, P. G.
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Sprache:	eng
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title	Effects of 50 keV2H+-ion implantation and rapid thermal annealing on the microstructure of YBCO thin films
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