Thermochemistry of thermal plasma chemical reactions. Part II. A survey of synthesis routes for silicon nitride production

Feasibility routes for thermal plasma production of silicon nitride powders are explored. First, a collation of the various proposed systems from the extant literature is examined. Reactant systems investigated include free silicon, silicon monoxide, silicon dioxide, silicon tetrachloride, silane, and other organosilicon precursors, along with various nitriding and reducing species. The reaction yields of these systems are brought to a common denominator by thermodynamic analysis and a first-step introduction of nucleation kinetics, including comparisons against published experiments and the authors' own research. In particular, it is observed that the formation of liquid-phase free silicon in the neighborhood of 2500 K is quite detrimental to silicon nitride yield, and furthermore, a high supersaturation of silicon should always be avoided.