Electrical conduction in Cu/Mn multilayer films

Electrical conduction in Cu/Mn multilayer films

Metallic superlattices of Cu and Mn have been synthesized on glass and mica substrates by a sequential evaporation technique. The electrical resistivity and the temperature coefficient of resistance (TCR) of layered Cu/Mn has been studied for various thicknesses (d) in the range 2-6 nm by varying th...

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Veröffentlicht in:Applied Physics A Solids and Surfaces 1989-09, Vol.49 (3), p.273-277
Hauptverfasser: Angadi, M. A., Nallamshetty, K.
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Nallamshetty, K.
description Metallic superlattices of Cu and Mn have been synthesized on glass and mica substrates by a sequential evaporation technique. The electrical resistivity and the temperature coefficient of resistance (TCR) of layered Cu/Mn has been studied for various thicknesses (d) in the range 2-6 nm by varying the number of double layers (n) from 5-35. The transition from a negative to positive TCR has been observed for d > 5 nm. The thickness dependence of room temperature resistivity ( rho sub RT ) and TCR shows oscillatory behaviour. Graphs. 21 ref.--AA
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