Design and Characterization by EXAFS, FTIR, and TEM of Rh-Sn/SiO2 Catalysts Active for NO-H2 Reaction

Design and Characterization by EXAFS, FTIR, and TEM of Rh-Sn/SiO2 Catalysts Active for NO-H2 Reaction

Rh-Sn/SiO2 catalysts, prepared by the selective reaction between Sn (CH3)4 and small Rh metallic particles supported on SiO2, showed much higher catalytic activities for NO-H2 reaction and NO dissociation than Rh/SiO2 and coimpregnation Rh-Sn/SiO2. In order to examine the important factors for the e...

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Veröffentlicht in:Journal of catalysis 1994-09, Vol.149 (1), p.70-80
Hauptverfasser: Tomishige, K., Asakura, K., Iwasawa, Y.
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Sprache:eng
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Catalysis
Catalysts: preparations and properties
Chemistry
Exact sciences and technology
General and physical chemistry
Theory of reactions, general kinetics. Catalysis. Nomenclature, chemical documentation, computer chemistry
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Asakura, K.
Iwasawa, Y.
description Rh-Sn/SiO2 catalysts, prepared by the selective reaction between Sn (CH3)4 and small Rh metallic particles supported on SiO2, showed much higher catalytic activities for NO-H2 reaction and NO dissociation than Rh/SiO2 and coimpregnation Rh-Sn/SiO2. In order to examine the important factors for the efficient catalysis of the Rh-Sn/SiO2 catalysts, the samples were characterized by Sn K- and Rh K-edge EXAFS, FTIR, H2 and CO adsorption, and TEM. For the Rh-Sn/SiO2 catalysts (Sn/Rh ≥ 0.4), the surface concentration of Sn to Rh was estimated to be Sns/Rhs = 3, where a Rh atom is surrounded by six Sn atoms. According to the results of the Sn K-edge EXAFS analysis, the bond distance between a Sn atom and the nearest-neighbor atom in the first layer atoms was 0.270 nn, and the bond distance between a Sn atom and a metal atom in the second layer was 0.290 nm, suggesting a relaxation of the first bimetallic layer. A surface model structure of Rh-Sn particles on SiO2 as a catalytically active bimetallic ensemble is discussed.
doi_str_mv 10.1006/jcat.1994.1273
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fullrecord <record><control><sourceid>elsevier_cross</sourceid><recordid>TN_cdi_crossref_primary_10_1006_jcat_1994_1273</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><els_id>S0021951784712735</els_id><sourcerecordid>S0021951784712735</sourcerecordid><originalsourceid>FETCH-LOGICAL-c230t-4629f23b89410a8a3cd0ca535d19507a26ea0bda72e2c02bd4755cad1f0aa5653</originalsourceid><addsrcrecordid>eNp1kMFPwjAUxhujiYhePffgkY3Xbt3WI5kgJCgJYOJteWs7KcHNtAsJ_vVuYrx5epfv-30vP0LuGYQMIBnvFbYhkzIOGU-jCzJgICHgiYwvyQCAs0AKll6TG-_3AIwJkQ2IeTTevtcUa03zHTpUrXH2C1vb1LQ80enbZLYZ0dl2sR79hLbTZ9pUdL0LNvV4Y1ec5tji4eRbTyeqtUdDq8bRl1Uw53RtOl5HuiVXFR68ufu9Q_I6m27zebBcPS3yyTJQPII2iBMuKx6VmYwZYIaR0qBQREIzKSBFnhiEUmPKDVfASx2nQijUrAJEkYhoSMIzV7nGe2eq4tPZD3SngkHRSyp6SUUvqegldYWHc-ETvcJD5bBW1v-1Yp4wmcRdLDvHTPf80RpXeGVNrYy2zqi20I39b-Ebr_N3-g</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Design and Characterization by EXAFS, FTIR, and TEM of Rh-Sn/SiO2 Catalysts Active for NO-H2 Reaction</title><source>Access via ScienceDirect (Elsevier)</source><creator>Tomishige, K. ; Asakura, K. ; Iwasawa, Y.</creator><creatorcontrib>Tomishige, K. ; Asakura, K. ; Iwasawa, Y.</creatorcontrib><description>Rh-Sn/SiO2 catalysts, prepared by the selective reaction between Sn (CH3)4 and small Rh metallic particles supported on SiO2, showed much higher catalytic activities for NO-H2 reaction and NO dissociation than Rh/SiO2 and coimpregnation Rh-Sn/SiO2. In order to examine the important factors for the efficient catalysis of the Rh-Sn/SiO2 catalysts, the samples were characterized by Sn K- and Rh K-edge EXAFS, FTIR, H2 and CO adsorption, and TEM. For the Rh-Sn/SiO2 catalysts (Sn/Rh ≥ 0.4), the surface concentration of Sn to Rh was estimated to be Sns/Rhs = 3, where a Rh atom is surrounded by six Sn atoms. According to the results of the Sn K-edge EXAFS analysis, the bond distance between a Sn atom and the nearest-neighbor atom in the first layer atoms was 0.270 nn, and the bond distance between a Sn atom and a metal atom in the second layer was 0.290 nm, suggesting a relaxation of the first bimetallic layer. A surface model structure of Rh-Sn particles on SiO2 as a catalytically active bimetallic ensemble is discussed.</description><identifier>ISSN: 0021-9517</identifier><identifier>EISSN: 1090-2694</identifier><identifier>DOI: 10.1006/jcat.1994.1273</identifier><identifier>CODEN: JCTLA5</identifier><language>eng</language><publisher>Amsterdam: Elsevier Inc</publisher><subject>Catalysis ; Catalysts: preparations and properties ; Chemistry ; Exact sciences and technology ; General and physical chemistry ; Theory of reactions, general kinetics. Catalysis. Nomenclature, chemical documentation, computer chemistry</subject><ispartof>Journal of catalysis, 1994-09, Vol.149 (1), p.70-80</ispartof><rights>1994 Academic Press</rights><rights>1994 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c230t-4629f23b89410a8a3cd0ca535d19507a26ea0bda72e2c02bd4755cad1f0aa5653</citedby></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://dx.doi.org/10.1006/jcat.1994.1273$$EHTML$$P50$$Gelsevier$$H</linktohtml><link.rule.ids>314,780,784,3550,27924,27925,45995</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&amp;idt=4261964$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Tomishige, K.</creatorcontrib><creatorcontrib>Asakura, K.</creatorcontrib><creatorcontrib>Iwasawa, Y.</creatorcontrib><title>Design and Characterization by EXAFS, FTIR, and TEM of Rh-Sn/SiO2 Catalysts Active for NO-H2 Reaction</title><title>Journal of catalysis</title><description>Rh-Sn/SiO2 catalysts, prepared by the selective reaction between Sn (CH3)4 and small Rh metallic particles supported on SiO2, showed much higher catalytic activities for NO-H2 reaction and NO dissociation than Rh/SiO2 and coimpregnation Rh-Sn/SiO2. In order to examine the important factors for the efficient catalysis of the Rh-Sn/SiO2 catalysts, the samples were characterized by Sn K- and Rh K-edge EXAFS, FTIR, H2 and CO adsorption, and TEM. For the Rh-Sn/SiO2 catalysts (Sn/Rh ≥ 0.4), the surface concentration of Sn to Rh was estimated to be Sns/Rhs = 3, where a Rh atom is surrounded by six Sn atoms. According to the results of the Sn K-edge EXAFS analysis, the bond distance between a Sn atom and the nearest-neighbor atom in the first layer atoms was 0.270 nn, and the bond distance between a Sn atom and a metal atom in the second layer was 0.290 nm, suggesting a relaxation of the first bimetallic layer. A surface model structure of Rh-Sn particles on SiO2 as a catalytically active bimetallic ensemble is discussed.</description><subject>Catalysis</subject><subject>Catalysts: preparations and properties</subject><subject>Chemistry</subject><subject>Exact sciences and technology</subject><subject>General and physical chemistry</subject><subject>Theory of reactions, general kinetics. Catalysis. Nomenclature, chemical documentation, computer chemistry</subject><issn>0021-9517</issn><issn>1090-2694</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1994</creationdate><recordtype>article</recordtype><recordid>eNp1kMFPwjAUxhujiYhePffgkY3Xbt3WI5kgJCgJYOJteWs7KcHNtAsJ_vVuYrx5epfv-30vP0LuGYQMIBnvFbYhkzIOGU-jCzJgICHgiYwvyQCAs0AKll6TG-_3AIwJkQ2IeTTevtcUa03zHTpUrXH2C1vb1LQ80enbZLYZ0dl2sR79hLbTZ9pUdL0LNvV4Y1ec5tji4eRbTyeqtUdDq8bRl1Uw53RtOl5HuiVXFR68ufu9Q_I6m27zebBcPS3yyTJQPII2iBMuKx6VmYwZYIaR0qBQREIzKSBFnhiEUmPKDVfASx2nQijUrAJEkYhoSMIzV7nGe2eq4tPZD3SngkHRSyp6SUUvqegldYWHc-ETvcJD5bBW1v-1Yp4wmcRdLDvHTPf80RpXeGVNrYy2zqi20I39b-Ebr_N3-g</recordid><startdate>199409</startdate><enddate>199409</enddate><creator>Tomishige, K.</creator><creator>Asakura, K.</creator><creator>Iwasawa, Y.</creator><general>Elsevier Inc</general><general>Elsevier</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>199409</creationdate><title>Design and Characterization by EXAFS, FTIR, and TEM of Rh-Sn/SiO2 Catalysts Active for NO-H2 Reaction</title><author>Tomishige, K. ; Asakura, K. ; Iwasawa, Y.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c230t-4629f23b89410a8a3cd0ca535d19507a26ea0bda72e2c02bd4755cad1f0aa5653</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1994</creationdate><topic>Catalysis</topic><topic>Catalysts: preparations and properties</topic><topic>Chemistry</topic><topic>Exact sciences and technology</topic><topic>General and physical chemistry</topic><topic>Theory of reactions, general kinetics. Catalysis. Nomenclature, chemical documentation, computer chemistry</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Tomishige, K.</creatorcontrib><creatorcontrib>Asakura, K.</creatorcontrib><creatorcontrib>Iwasawa, Y.</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><jtitle>Journal of catalysis</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Tomishige, K.</au><au>Asakura, K.</au><au>Iwasawa, Y.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Design and Characterization by EXAFS, FTIR, and TEM of Rh-Sn/SiO2 Catalysts Active for NO-H2 Reaction</atitle><jtitle>Journal of catalysis</jtitle><date>1994-09</date><risdate>1994</risdate><volume>149</volume><issue>1</issue><spage>70</spage><epage>80</epage><pages>70-80</pages><issn>0021-9517</issn><eissn>1090-2694</eissn><coden>JCTLA5</coden><abstract>Rh-Sn/SiO2 catalysts, prepared by the selective reaction between Sn (CH3)4 and small Rh metallic particles supported on SiO2, showed much higher catalytic activities for NO-H2 reaction and NO dissociation than Rh/SiO2 and coimpregnation Rh-Sn/SiO2. In order to examine the important factors for the efficient catalysis of the Rh-Sn/SiO2 catalysts, the samples were characterized by Sn K- and Rh K-edge EXAFS, FTIR, H2 and CO adsorption, and TEM. For the Rh-Sn/SiO2 catalysts (Sn/Rh ≥ 0.4), the surface concentration of Sn to Rh was estimated to be Sns/Rhs = 3, where a Rh atom is surrounded by six Sn atoms. According to the results of the Sn K-edge EXAFS analysis, the bond distance between a Sn atom and the nearest-neighbor atom in the first layer atoms was 0.270 nn, and the bond distance between a Sn atom and a metal atom in the second layer was 0.290 nm, suggesting a relaxation of the first bimetallic layer. A surface model structure of Rh-Sn particles on SiO2 as a catalytically active bimetallic ensemble is discussed.</abstract><cop>Amsterdam</cop><pub>Elsevier Inc</pub><doi>10.1006/jcat.1994.1273</doi><tpages>11</tpages></addata></record>
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Catalysts: preparations and properties
Chemistry
Exact sciences and technology
General and physical chemistry
Theory of reactions, general kinetics. Catalysis. Nomenclature, chemical documentation, computer chemistry
title Design and Characterization by EXAFS, FTIR, and TEM of Rh-Sn/SiO2 Catalysts Active for NO-H2 Reaction
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-29T01%3A02%3A39IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-elsevier_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Design%20and%20Characterization%20by%20EXAFS,%20FTIR,%20and%20TEM%20of%20Rh-Sn/SiO2%20Catalysts%20Active%20for%20NO-H2%20Reaction&rft.jtitle=Journal%20of%20catalysis&rft.au=Tomishige,%20K.&rft.date=1994-09&rft.volume=149&rft.issue=1&rft.spage=70&rft.epage=80&rft.pages=70-80&rft.issn=0021-9517&rft.eissn=1090-2694&rft.coden=JCTLA5&rft_id=info:doi/10.1006/jcat.1994.1273&rft_dat=%3Celsevier_cross%3ES0021951784712735%3C/elsevier_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rft_els_id=S0021951784712735&rfr_iscdi=true