Performance of customized control charts to detect process disturbances
In this paper we demonstrate the use of control charts based on orthogonal contrasts for a semiconductor manufacturing process. The statistical performance of individuals control charts based on these contrasts and their exponentially weighted moving average counterparts is compared to that of the t...
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| Veröffentlicht in: | Quality and reliability engineering international 2001-05, Vol.17 (3), p.205-218 |
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| container_title | Quality and reliability engineering international |
| container_volume | 17 |
| creator | Heredia-Langner, Alejandro Montgomery, Douglas C. Runger, George C. Borror, Connie M. Post, Richard I. |
| description | In this paper we demonstrate the use of control charts based on orthogonal contrasts for a semiconductor manufacturing process. The statistical performance of individuals control charts based on these contrasts and their exponentially weighted moving average counterparts is compared to that of the traditional approach. Contrast‐based charts have superior detection capabilities than the traditional approach when targeted at specific process disturbances. Copyright © 2001 John Wiley & Sons, Ltd. |
| doi_str_mv | 10.1002/qre.390 |
| format | Article |
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| fulltext | fulltext |
| identifier | ISSN: 0748-8017 |
| ispartof | Quality and reliability engineering international, 2001-05, Vol.17 (3), p.205-218 |
| issn | 0748-8017 1099-1638 |
| language | eng |
| recordid | cdi_crossref_primary_10_1002_qre_390 |
| source | Wiley-Blackwell Journals |
| subjects | EWMA orthogonal contrasts process monitoring semiconducter manufacturing |
| title | Performance of customized control charts to detect process disturbances |
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