High Rate Deposition of Magnetic Material by Gas Flow Sputtering

For different applications like thin film sensors or microactuators soft and hard magnetic films are required to create and guide the magnetic flux. In many cases, the required thickness of the coatings is well above 10 µm. For the preparation of coatings various techniques are used. In this paper w...

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Veröffentlicht in:	Plasma processes and polymers 2007-04, Vol.4 (S1), p.S129-S133
Hauptverfasser:	Bandorf, Ralf, Bloche, Andre, Ortner, Kai, Lüthje, Holger, Jung, Thomas
Format:	Artikel
Sprache:	eng
Schlagworte:	gas flow sputtering hard magnetic films high-rate deposition magnetic films physical vapour deposition (PVD) scanning electron microscopy (SEM) soft magnetic films sputtering thin films
Online-Zugang:	Volltext
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