Inert Gas Admixtures in PECVD of Titanium Dioxide Thin Films on Polymers-Influence on the UV Absorptance of the Films

A low pressure radio frequency discharge (200 W for 5 min) was operated in oxygen, nitrogen/oxygen and argon/oxygen with small admixtures of titanium(IV)isopropoxide (TTIP). By means of the O2‐flow, the O2‐to‐TTIP ratio q was varied in all the gas mixtures. Besides the growth rate, the absorptance o...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Veröffentlicht in:	Plasma processes and polymers 2007-04, Vol.4 (S1), p.S64-S68
Hauptverfasser:	Sonnenfeld, Axel, Rudolf von Rohr, Philipp
Format:	Artikel
Sprache:	eng
Schlagworte:	argon nitrogen plasma enhanced chemical vapour deposition (PECVD) polymeric substrate titanium dioxide titanium(IV)-isopropoxide (TTIP) UV absorption
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

container_end_page	S68
container_issue	S1
container_start_page	S64
container_title	Plasma processes and polymers
container_volume	4
creator	Sonnenfeld, Axel Rudolf von Rohr, Philipp
description	A low pressure radio frequency discharge (200 W for 5 min) was operated in oxygen, nitrogen/oxygen and argon/oxygen with small admixtures of titanium(IV)isopropoxide (TTIP). By means of the O2‐flow, the O2‐to‐TTIP ratio q was varied in all the gas mixtures. Besides the growth rate, the absorptance of films deposited was determined in the range of 200–500 nm. Accordingly, their cut‐off wavelength increased with q for mixtures containing N2 or Ar, while it was unaffected for O2/TTIP mixtures. At 310 nm, the absorption coefficient was a310 = 13 µm−1 for q ≈ 44 in Ar/O2/TTIP and marginally lower in N2/O2/TTIP as well as O2/TTIP. But, for decreasing q, a drastic decrease in a310 ≈ 8 µm−1 was witnessed for O2/TTIP mixtures. In contrast, a310 increased by 2 µm−1 for gas mixtures with Ar or N2.
doi_str_mv	10.1002/ppap.200730404
format	Article
fullrecord	<record><control><sourceid>wiley_cross</sourceid><recordid>TN_cdi_crossref_primary_10_1002_ppap_200730404</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>PPAP200730404</sourcerecordid><originalsourceid>FETCH-LOGICAL-c3674-32ad0179d333a4b58f8f888b623fe306eb834dc7019bc68a52417d0c35927e143</originalsourceid><addsrcrecordid>eNqFkEtPwzAQhCMEEqVw5ew_kLKOE8c5RulTqiASaTlaTuKohrxkJ6L99yQtqrihPexqdr45jGU9Y5hhAOelbUU7cwB8Ai64N9YEU-zYjNHg9np7cG89GPMJQMBjMLH6TS11h1bCoDCv1LHrtTRI1SheRPs5agqUqE7Uqq_QXDVHlUuUHIb3UpWVQc3ga8pTJbWxN3VR9rLO5Kh2B4l2exSmptHtwI9qcVbP4KN1V4jSyKffPbV2y0USre3t22oThVs7I9R3beKIHLAf5IQQ4aYeK4ZhLKUOKSQBKlNG3DzzAQdpRpnwHBf7OWTECxxfYpdMrdklN9ONMVoWvNWqEvrEMfCxND6Wxq-lDUBwAb5VKU__uHkch_Ff1r6wynTyeGWF_uLUJ77HP15XnL4nHoFozQPyA9xYfzk</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Inert Gas Admixtures in PECVD of Titanium Dioxide Thin Films on Polymers-Influence on the UV Absorptance of the Films</title><source>Wiley Online Library All Journals</source><creator>Sonnenfeld, Axel ; Rudolf von Rohr, Philipp</creator><creatorcontrib>Sonnenfeld, Axel ; Rudolf von Rohr, Philipp</creatorcontrib><description>A low pressure radio frequency discharge (200 W for 5 min) was operated in oxygen, nitrogen/oxygen and argon/oxygen with small admixtures of titanium(IV)isopropoxide (TTIP). By means of the O2‐flow, the O2‐to‐TTIP ratio q was varied in all the gas mixtures. Besides the growth rate, the absorptance of films deposited was determined in the range of 200–500 nm. Accordingly, their cut‐off wavelength increased with q for mixtures containing N2 or Ar, while it was unaffected for O2/TTIP mixtures. At 310 nm, the absorption coefficient was a310 = 13 µm−1 for q ≈ 44 in Ar/O2/TTIP and marginally lower in N2/O2/TTIP as well as O2/TTIP. But, for decreasing q, a drastic decrease in a310 ≈ 8 µm−1 was witnessed for O2/TTIP mixtures. In contrast, a310 increased by 2 µm−1 for gas mixtures with Ar or N2.</description><identifier>ISSN: 1612-8850</identifier><identifier>EISSN: 1612-8869</identifier><identifier>DOI: 10.1002/ppap.200730404</identifier><language>eng</language><publisher>Weinheim: WILEY-VCH Verlag</publisher><subject>argon ; nitrogen ; plasma enhanced chemical vapour deposition (PECVD) ; polymeric substrate ; titanium dioxide ; titanium(IV)-isopropoxide (TTIP) ; UV absorption</subject><ispartof>Plasma processes and polymers, 2007-04, Vol.4 (S1), p.S64-S68</ispartof><rights>Copyright © 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim</rights><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c3674-32ad0179d333a4b58f8f888b623fe306eb834dc7019bc68a52417d0c35927e143</citedby><cites>FETCH-LOGICAL-c3674-32ad0179d333a4b58f8f888b623fe306eb834dc7019bc68a52417d0c35927e143</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://onlinelibrary.wiley.com/doi/pdf/10.1002%2Fppap.200730404$$EPDF$$P50$$Gwiley$$H</linktopdf><linktohtml>$$Uhttps://onlinelibrary.wiley.com/doi/full/10.1002%2Fppap.200730404$$EHTML$$P50$$Gwiley$$H</linktohtml><link.rule.ids>314,780,784,1417,27924,27925,45574,45575</link.rule.ids></links><search><creatorcontrib>Sonnenfeld, Axel</creatorcontrib><creatorcontrib>Rudolf von Rohr, Philipp</creatorcontrib><title>Inert Gas Admixtures in PECVD of Titanium Dioxide Thin Films on Polymers-Influence on the UV Absorptance of the Films</title><title>Plasma processes and polymers</title><addtitle>Plasma Processes Polym</addtitle><description>A low pressure radio frequency discharge (200 W for 5 min) was operated in oxygen, nitrogen/oxygen and argon/oxygen with small admixtures of titanium(IV)isopropoxide (TTIP). By means of the O2‐flow, the O2‐to‐TTIP ratio q was varied in all the gas mixtures. Besides the growth rate, the absorptance of films deposited was determined in the range of 200–500 nm. Accordingly, their cut‐off wavelength increased with q for mixtures containing N2 or Ar, while it was unaffected for O2/TTIP mixtures. At 310 nm, the absorption coefficient was a310 = 13 µm−1 for q ≈ 44 in Ar/O2/TTIP and marginally lower in N2/O2/TTIP as well as O2/TTIP. But, for decreasing q, a drastic decrease in a310 ≈ 8 µm−1 was witnessed for O2/TTIP mixtures. In contrast, a310 increased by 2 µm−1 for gas mixtures with Ar or N2.</description><subject>argon</subject><subject>nitrogen</subject><subject>plasma enhanced chemical vapour deposition (PECVD)</subject><subject>polymeric substrate</subject><subject>titanium dioxide</subject><subject>titanium(IV)-isopropoxide (TTIP)</subject><subject>UV absorption</subject><issn>1612-8850</issn><issn>1612-8869</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2007</creationdate><recordtype>article</recordtype><recordid>eNqFkEtPwzAQhCMEEqVw5ew_kLKOE8c5RulTqiASaTlaTuKohrxkJ6L99yQtqrihPexqdr45jGU9Y5hhAOelbUU7cwB8Ai64N9YEU-zYjNHg9np7cG89GPMJQMBjMLH6TS11h1bCoDCv1LHrtTRI1SheRPs5agqUqE7Uqq_QXDVHlUuUHIb3UpWVQc3ga8pTJbWxN3VR9rLO5Kh2B4l2exSmptHtwI9qcVbP4KN1V4jSyKffPbV2y0USre3t22oThVs7I9R3beKIHLAf5IQQ4aYeK4ZhLKUOKSQBKlNG3DzzAQdpRpnwHBf7OWTECxxfYpdMrdklN9ONMVoWvNWqEvrEMfCxND6Wxq-lDUBwAb5VKU__uHkch_Ff1r6wynTyeGWF_uLUJ77HP15XnL4nHoFozQPyA9xYfzk</recordid><startdate>200704</startdate><enddate>200704</enddate><creator>Sonnenfeld, Axel</creator><creator>Rudolf von Rohr, Philipp</creator><general>WILEY-VCH Verlag</general><general>WILEY‐VCH Verlag</general><scope>BSCLL</scope><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>200704</creationdate><title>Inert Gas Admixtures in PECVD of Titanium Dioxide Thin Films on Polymers-Influence on the UV Absorptance of the Films</title><author>Sonnenfeld, Axel ; Rudolf von Rohr, Philipp</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c3674-32ad0179d333a4b58f8f888b623fe306eb834dc7019bc68a52417d0c35927e143</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2007</creationdate><topic>argon</topic><topic>nitrogen</topic><topic>plasma enhanced chemical vapour deposition (PECVD)</topic><topic>polymeric substrate</topic><topic>titanium dioxide</topic><topic>titanium(IV)-isopropoxide (TTIP)</topic><topic>UV absorption</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Sonnenfeld, Axel</creatorcontrib><creatorcontrib>Rudolf von Rohr, Philipp</creatorcontrib><collection>Istex</collection><collection>CrossRef</collection><jtitle>Plasma processes and polymers</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Sonnenfeld, Axel</au><au>Rudolf von Rohr, Philipp</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Inert Gas Admixtures in PECVD of Titanium Dioxide Thin Films on Polymers-Influence on the UV Absorptance of the Films</atitle><jtitle>Plasma processes and polymers</jtitle><addtitle>Plasma Processes Polym</addtitle><date>2007-04</date><risdate>2007</risdate><volume>4</volume><issue>S1</issue><spage>S64</spage><epage>S68</epage><pages>S64-S68</pages><issn>1612-8850</issn><eissn>1612-8869</eissn><abstract>A low pressure radio frequency discharge (200 W for 5 min) was operated in oxygen, nitrogen/oxygen and argon/oxygen with small admixtures of titanium(IV)isopropoxide (TTIP). By means of the O2‐flow, the O2‐to‐TTIP ratio q was varied in all the gas mixtures. Besides the growth rate, the absorptance of films deposited was determined in the range of 200–500 nm. Accordingly, their cut‐off wavelength increased with q for mixtures containing N2 or Ar, while it was unaffected for O2/TTIP mixtures. At 310 nm, the absorption coefficient was a310 = 13 µm−1 for q ≈ 44 in Ar/O2/TTIP and marginally lower in N2/O2/TTIP as well as O2/TTIP. But, for decreasing q, a drastic decrease in a310 ≈ 8 µm−1 was witnessed for O2/TTIP mixtures. In contrast, a310 increased by 2 µm−1 for gas mixtures with Ar or N2.</abstract><cop>Weinheim</cop><pub>WILEY-VCH Verlag</pub><doi>10.1002/ppap.200730404</doi><tpages>5</tpages><oa>free_for_read</oa></addata></record>
fulltext	fulltext
identifier	ISSN: 1612-8850
ispartof	Plasma processes and polymers, 2007-04, Vol.4 (S1), p.S64-S68
issn	1612-8850 1612-8869
language	eng
recordid	cdi_crossref_primary_10_1002_ppap_200730404
source	Wiley Online Library All Journals
subjects	argon nitrogen plasma enhanced chemical vapour deposition (PECVD) polymeric substrate titanium dioxide titanium(IV)-isopropoxide (TTIP) UV absorption
title	Inert Gas Admixtures in PECVD of Titanium Dioxide Thin Films on Polymers-Influence on the UV Absorptance of the Films
url	https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-07T10%3A07%3A17IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-wiley_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Inert%20Gas%20Admixtures%20in%20PECVD%20of%20Titanium%20Dioxide%20Thin%20Films%20on%20Polymers-Influence%20on%20the%20UV%20Absorptance%20of%20the%20Films&rft.jtitle=Plasma%20processes%20and%20polymers&rft.au=Sonnenfeld,%20Axel&rft.date=2007-04&rft.volume=4&rft.issue=S1&rft.spage=S64&rft.epage=S68&rft.pages=S64-S68&rft.issn=1612-8850&rft.eissn=1612-8869&rft_id=info:doi/10.1002/ppap.200730404&rft_dat=%3Cwiley_cross%3EPPAP200730404%3C/wiley_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true