Formation of deprotected fuzzy blobs in chemically amplified resists

The requirement of nanometer dimensional control in photolithographic patterning underlies the future of emerging technologies, including next‐generation semiconductors, nanofluids, photonics, and microelectromechanical systems. For chemically amplified resists, dimensional control is mediated by th...

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Veröffentlicht in:	Journal of polymer science. Part B, Polymer physics Polymer physics, 2004-09, Vol.42 (17), p.3063-3069
Hauptverfasser:	Jones, Ronald L., Hu, Tengjiao, Lin, Eric K., Wu, Wen-Li, Goldfarb, Dario L., Angelopoulos, Marie, Trinque, Brian C., Schmid, Gerard M., Stewart, Michael D., Willson, C. Grant
Format:	Artikel
Sprache:	eng
Schlagworte:	micropatterning morphology nanotechnology photolithography photoresists reaction diffusion small-angle neutron scattering
Online-Zugang:	Volltext
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