A 50 Gb/s PAM‐4 VCSEL diode driver in 90 nm CMOS technology
In this article, a broadband vertical cavity surface emitting laser (VCSEL) diode driver circuit has been implemented in TSMC 90‐nm complementary metal‐oxide‐semiconductor technology. The laser diode driver (LDD) circuit includes a pre‐amplifier, a post‐amplifier paralleling with a differentiator, a...
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Veröffentlicht in: | Microwave and optical technology letters 2021-06, Vol.63 (6), p.1682-1687 |
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Hauptverfasser: | , , |
Format: | Artikel |
Sprache: | eng |
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Online-Zugang: | Volltext |
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Zusammenfassung: | In this article, a broadband vertical cavity surface emitting laser (VCSEL) diode driver circuit has been implemented in TSMC 90‐nm complementary metal‐oxide‐semiconductor technology. The laser diode driver (LDD) circuit includes a pre‐amplifier, a post‐amplifier paralleling with a differentiator, and a current steering circuit. The input to the LDD can be two 25 Gb/s nonreturn to zero voltage signals, which can thereby generate a 50 Gb/s four‐level pulse amplitude modulation (PAM‐4) current signal to drive a VCSEL diode. Using the LDD chip on a printed circuit board, clear PAM‐4 eye diagrams corresponding to 25, 40, and 50 Gb/s can be measured to verify the performance of the LDD chip. The VCSEL LDD chip has been applied in the optical transmitter for short‐reach transmissions. |
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ISSN: | 0895-2477 1098-2760 |
DOI: | 10.1002/mop.32790 |