Photolithography using half-tone phase-shifting mask

A half‐tone phase‐shifting mask (HPM) is effective in improving resolution and focus latitude of an isolated hole pattern. HPM can be fabricated by the conventional method and a practical phase‐shifting technique can be realized using HPM. The authors developed a mask‐defect repair method and an opa...

Ausführliche Beschreibung

Bibliographische Detailangaben

Veröffentlicht in:	Electronics & communications in Japan. Part 2, Electronics Electronics, 1996, Vol.79 (8), p.73-83
Hauptverfasser:	Hasegawa, Norio, Imai, Akira, Terasawa, Tsuneo, Hayano, Katsuya, Tanaka, Toshihiko, Oki, Yumiko, Murai, Fumio
Format:	Artikel
Sprache:	eng
Schlagworte:	additional pattern defect repair focus half-tone phase shift hole latitude Lithography mask
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!