Titanium Dioxide Thin Films Deposited by Electric Field-Assisted CVD: Effect on Antimicrobial and Photocatalytic Properties

Thin films of anatase titanium dioxide are deposited on fluorine-doped tin oxide (FTO) glass substrates utilizing the electric field-assisted aerosol (EA) CVD reaction of titanium isopropoxide in toluene at 450 degrees C. The as-deposited films are characterized using scanning electron microscopy (S...

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Veröffentlicht in:	Chemical vapor deposition 2015-03, Vol.21 (1-2-3), p.63-70
Hauptverfasser:	Romero, Luz, Piccirillo, Clara, Castro, Paula M. L., Bowman, Christopher, Warwick, Michael E. A., Binions, Russell
Format:	Artikel
Sprache:	eng
Schlagworte:	Catalytic properties Semiconductors Surface properties Thin films Vapor deposition
Online-Zugang:	Volltext
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