PECVD of Carbon Nanostructures in Hydrocarbon-Based RF Plasmas
Different aspects of the plasma‐enhanced chemical vapor deposition of various carbon nanostructures in the ionized gas phase of high‐density, low‐temperature reactive plasmas of Ar+H2+CH4 gas mixtures are studied. The growth techniques, surface morphologies, densities and fluxes of major reactive sp...
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| Veröffentlicht in: | Contributions to plasma physics (1988) 2005-10, Vol.45 (7), p.514-521 |
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| container_issue | 7 |
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| container_title | Contributions to plasma physics (1988) |
| container_volume | 45 |
| creator | Ostrikov, K. Tsakadze, Z. Rutkevych, P. P. Long, J. D. Xu, S. Denysenko, I. |
| description | Different aspects of the plasma‐enhanced chemical vapor deposition of various carbon nanostructures in the ionized gas phase of high‐density, low‐temperature reactive plasmas of Ar+H2+CH4 gas mixtures are studied. The growth techniques, surface morphologies, densities and fluxes of major reactive species in the discharge, and effects of the transport of the plasma‐grown nanoparticles through the near‐substrate plasma sheath are examined. Possible growth precursors of the carbon nanostructures are also discussed. In particular, the experimental and numerical results indicate that it is likely that the aligned carbon nanotip structures are predominantly grown by the molecular and radical units, whereas the plasma‐grown nanoparticles are crucial components of polymorphous carbon films. (© 2005 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim) |
| doi_str_mv | 10.1002/ctpp.200510057 |
| format | Article |
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(© 2005 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)</description><identifier>ISSN: 0863-1042</identifier><identifier>EISSN: 1521-3986</identifier><identifier>DOI: 10.1002/ctpp.200510057</identifier><identifier>CODEN: BPPHAA</identifier><language>eng</language><publisher>Berlin: WILEY-VCH Verlag</publisher><subject>Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) ; Cross-disciplinary physics: materials science; rheology ; Exact sciences and technology ; HF discharge plasma ; Materials science ; Methods of deposition of films and coatings; film growth and epitaxy ; Nanostructures ; Physics ; Physics of gases, plasmas and electric discharges ; Physics of plasmas and electric discharges ; Plasma applications ; Plasma-based ion implantation and deposition ; vapor deposition</subject><ispartof>Contributions to plasma physics (1988), 2005-10, Vol.45 (7), p.514-521</ispartof><rights>Copyright © 2005 WILEY‐VCH Verlag GmbH & Co. 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Plasma Phys</addtitle><date>2005-10</date><risdate>2005</risdate><volume>45</volume><issue>7</issue><spage>514</spage><epage>521</epage><pages>514-521</pages><issn>0863-1042</issn><eissn>1521-3986</eissn><coden>BPPHAA</coden><abstract>Different aspects of the plasma‐enhanced chemical vapor deposition of various carbon nanostructures in the ionized gas phase of high‐density, low‐temperature reactive plasmas of Ar+H2+CH4 gas mixtures are studied. The growth techniques, surface morphologies, densities and fluxes of major reactive species in the discharge, and effects of the transport of the plasma‐grown nanoparticles through the near‐substrate plasma sheath are examined. Possible growth precursors of the carbon nanostructures are also discussed. 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| ispartof | Contributions to plasma physics (1988), 2005-10, Vol.45 (7), p.514-521 |
| issn | 0863-1042 1521-3986 |
| language | eng |
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| source | Wiley Online Library All Journals |
| subjects | Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) Cross-disciplinary physics: materials science rheology Exact sciences and technology HF discharge plasma Materials science Methods of deposition of films and coatings film growth and epitaxy Nanostructures Physics Physics of gases, plasmas and electric discharges Physics of plasmas and electric discharges Plasma applications Plasma-based ion implantation and deposition vapor deposition |
| title | PECVD of Carbon Nanostructures in Hydrocarbon-Based RF Plasmas |
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