Front Cover: Mesoporous Silica Supported Highly Dispersed GaN Catalysts Synthesized by Thermal Atomic Layer Deposition for Propane Dehydrogenation (ChemCatChem 19/2022)

The Front Cover depicts the propane dehydrogenation (PDH) reaction on the supported gallium nitride (GaN) catalyst. In their Research Article, Hao Feng and co‐workers report a novel method of synthesizing high surface area GaN catalysts supported on mesoporous silica (MCM‐41) using thermal atomic la...

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Veröffentlicht in:ChemCatChem 2022-10, Vol.14 (19), p.n/a
Hauptverfasser: Zhang, Wangle, Li, Jianguo, Hui, Longfei, Gong, Ting, Qin, Lijun, Lu, Jian, Feng, Hao
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container_issue 19
container_start_page
container_title ChemCatChem
container_volume 14
creator Zhang, Wangle
Li, Jianguo
Hui, Longfei
Gong, Ting
Qin, Lijun
Lu, Jian
Feng, Hao
description The Front Cover depicts the propane dehydrogenation (PDH) reaction on the supported gallium nitride (GaN) catalyst. In their Research Article, Hao Feng and co‐workers report a novel method of synthesizing high surface area GaN catalysts supported on mesoporous silica (MCM‐41) using thermal atomic layer deposition (ALD). GaN nanoparticles are uniformly dispersed on the surface of MCM‐41 with ordered channel structures. Properties of highly dispersed GaN species were studied by various microscopic and spectroscopic techniques. In PDH reaction, the ALD GaN/MCM‐41 catalysts demonstrated excellent activity and selectivity. More information can be found in the Research Article by Hao Feng and co‐workers .
doi_str_mv 10.1002/cctc.202201063
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subjects atomic layer deposition (ALD)
Gallium nitride (GaN)
propane dehydrogenation
supported catalyst
title Front Cover: Mesoporous Silica Supported Highly Dispersed GaN Catalysts Synthesized by Thermal Atomic Layer Deposition for Propane Dehydrogenation (ChemCatChem 19/2022)
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