Improvement of plasma etching durability of positive working resist by copolymerization, blending, and crosslinking

The plasma etching durability of O2 and CCl4 was investigated for copolymer and polymer blend of poly(methyl methacrylate) (PMMA) and poly(α‐methylstyrene) (PMSt) as a function of MSt content. Further, the effects of crosslinking on plasma etching were studied by incorporating N‐methylolated methacr...

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Veröffentlicht in:	Journal of applied polymer science 1987-09, Vol.34 (4), p.1677-1691
Hauptverfasser:	Ueno, Nobuo, Doi, Yasunori, Sugita, Kazuyuki, Sasaki, Shigeru, Nagata, Shiro
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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