Preparation of positive photoreactive polyimides and their characterization
Polyimide precursors were synthesized from a diamine and a diacid chloride that was derived from the reactant with promellitic dianhydride and o‐nitrobenzyl alcohol. Their thermal properties were studied in nitrogen using dynamic thermogravimetry, and the photoreaction mechanism was investigated by...
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Veröffentlicht in: | Journal of applied polymer science 1987-04, Vol.33 (5), p.1763-1775 |
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container_title | Journal of applied polymer science |
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creator | Kubota, Shigeru Moriwaki, Toshimoto Ando, Torahiko Fukami, Akira |
description | Polyimide precursors were synthesized from a diamine and a diacid chloride that was derived from the reactant with promellitic dianhydride and o‐nitrobenzyl alcohol. Their thermal properties were studied in nitrogen using dynamic thermogravimetry, and the photoreaction mechanism was investigated by ultraviolet and infrared spectrophotometry. The polyimide precursors were spin‐coated onto silicon wafers, prebaked, and then exposed to UV light from a high pressure Hg–Xe lamp. When the films were dipped into 2% aqueous KOH after irradiation, the exposed area dissolved forming high resolution patterns. Relative sensitivities of the polymers were determined. |
doi_str_mv | 10.1002/app.1987.070330528 |
format | Article |
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Their thermal properties were studied in nitrogen using dynamic thermogravimetry, and the photoreaction mechanism was investigated by ultraviolet and infrared spectrophotometry. The polyimide precursors were spin‐coated onto silicon wafers, prebaked, and then exposed to UV light from a high pressure Hg–Xe lamp. When the films were dipped into 2% aqueous KOH after irradiation, the exposed area dissolved forming high resolution patterns. Relative sensitivities of the polymers were determined.</description><identifier>ISSN: 0021-8995</identifier><identifier>EISSN: 1097-4628</identifier><identifier>DOI: 10.1002/app.1987.070330528</identifier><identifier>CODEN: JAPNAB</identifier><language>eng</language><publisher>New York: Wiley Subscription Services, Inc., A Wiley Company</publisher><subject>Applied sciences ; Exact sciences and technology ; Physical properties ; Polymer industry, paints, wood ; Properties and testing ; Radiation influence ; Technology of polymers</subject><ispartof>Journal of applied polymer science, 1987-04, Vol.33 (5), p.1763-1775</ispartof><rights>Copyright © 1987 John Wiley & Sons, Inc.</rights><rights>1988 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c3658-34ab04cf46799857a677c974bab9dd84fa88334891b6cce501d5d6a11bebd45c3</citedby></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://onlinelibrary.wiley.com/doi/pdf/10.1002%2Fapp.1987.070330528$$EPDF$$P50$$Gwiley$$H</linktopdf><linktohtml>$$Uhttps://onlinelibrary.wiley.com/doi/full/10.1002%2Fapp.1987.070330528$$EHTML$$P50$$Gwiley$$H</linktohtml><link.rule.ids>314,780,784,1417,27924,27925,45574,45575</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=7569299$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Kubota, Shigeru</creatorcontrib><creatorcontrib>Moriwaki, Toshimoto</creatorcontrib><creatorcontrib>Ando, Torahiko</creatorcontrib><creatorcontrib>Fukami, Akira</creatorcontrib><title>Preparation of positive photoreactive polyimides and their characterization</title><title>Journal of applied polymer science</title><addtitle>J. Appl. Polym. Sci</addtitle><description>Polyimide precursors were synthesized from a diamine and a diacid chloride that was derived from the reactant with promellitic dianhydride and o‐nitrobenzyl alcohol. Their thermal properties were studied in nitrogen using dynamic thermogravimetry, and the photoreaction mechanism was investigated by ultraviolet and infrared spectrophotometry. The polyimide precursors were spin‐coated onto silicon wafers, prebaked, and then exposed to UV light from a high pressure Hg–Xe lamp. When the films were dipped into 2% aqueous KOH after irradiation, the exposed area dissolved forming high resolution patterns. Relative sensitivities of the polymers were determined.</description><subject>Applied sciences</subject><subject>Exact sciences and technology</subject><subject>Physical properties</subject><subject>Polymer industry, paints, wood</subject><subject>Properties and testing</subject><subject>Radiation influence</subject><subject>Technology of polymers</subject><issn>0021-8995</issn><issn>1097-4628</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1987</creationdate><recordtype>article</recordtype><recordid>eNqNkEtLw0AUhQdRsFb_gKss3KbOZN7gpoqtYtUsfO2Gm8mEjrZNmAlq_fWmRopLV5cD5zsXPoSOCR4RjLNTaJoR0UqOsMSUYp6pHTQgWMuUiUztokFXIqnSmu-jgxhfMSaEYzFAN3lwDQRofb1K6ipp6uhb_-6SZl63dXBg-1Qv1n7pSxcTWJVJO3c-JHbegbZ1wX_98Idor4JFdEe_d4geJ5cPF1fp7H56fTGepZYKrlLKoMDMVkxIrRWXIKS0WrICCl2WilWgFKVMaVIIax3HpOSlAEIKV5SMWzpEWb9rQx1jcJVpgl9CWBuCzUaH6XSYjQ6z1dFBJz3UQLSwqAKsrI9bUnKhM6272llf-_ALt_7HsBnn-d8vaY_72LrPLQ7hzQhJJTfPd1Pzkp_f4ic8MYp-AyZcgqw</recordid><startdate>198704</startdate><enddate>198704</enddate><creator>Kubota, Shigeru</creator><creator>Moriwaki, Toshimoto</creator><creator>Ando, Torahiko</creator><creator>Fukami, Akira</creator><general>Wiley Subscription Services, Inc., A Wiley Company</general><general>Wiley</general><scope>BSCLL</scope><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>198704</creationdate><title>Preparation of positive photoreactive polyimides and their characterization</title><author>Kubota, Shigeru ; Moriwaki, Toshimoto ; Ando, Torahiko ; Fukami, Akira</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c3658-34ab04cf46799857a677c974bab9dd84fa88334891b6cce501d5d6a11bebd45c3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1987</creationdate><topic>Applied sciences</topic><topic>Exact sciences and technology</topic><topic>Physical properties</topic><topic>Polymer industry, paints, wood</topic><topic>Properties and testing</topic><topic>Radiation influence</topic><topic>Technology of polymers</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Kubota, Shigeru</creatorcontrib><creatorcontrib>Moriwaki, Toshimoto</creatorcontrib><creatorcontrib>Ando, Torahiko</creatorcontrib><creatorcontrib>Fukami, Akira</creatorcontrib><collection>Istex</collection><collection>Pascal-Francis</collection><collection>CrossRef</collection><jtitle>Journal of applied polymer science</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Kubota, Shigeru</au><au>Moriwaki, Toshimoto</au><au>Ando, Torahiko</au><au>Fukami, Akira</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Preparation of positive photoreactive polyimides and their characterization</atitle><jtitle>Journal of applied polymer science</jtitle><addtitle>J. Appl. Polym. Sci</addtitle><date>1987-04</date><risdate>1987</risdate><volume>33</volume><issue>5</issue><spage>1763</spage><epage>1775</epage><pages>1763-1775</pages><issn>0021-8995</issn><eissn>1097-4628</eissn><coden>JAPNAB</coden><abstract>Polyimide precursors were synthesized from a diamine and a diacid chloride that was derived from the reactant with promellitic dianhydride and o‐nitrobenzyl alcohol. Their thermal properties were studied in nitrogen using dynamic thermogravimetry, and the photoreaction mechanism was investigated by ultraviolet and infrared spectrophotometry. The polyimide precursors were spin‐coated onto silicon wafers, prebaked, and then exposed to UV light from a high pressure Hg–Xe lamp. When the films were dipped into 2% aqueous KOH after irradiation, the exposed area dissolved forming high resolution patterns. Relative sensitivities of the polymers were determined.</abstract><cop>New York</cop><pub>Wiley Subscription Services, Inc., A Wiley Company</pub><doi>10.1002/app.1987.070330528</doi><tpages>13</tpages></addata></record> |
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subjects | Applied sciences Exact sciences and technology Physical properties Polymer industry, paints, wood Properties and testing Radiation influence Technology of polymers |
title | Preparation of positive photoreactive polyimides and their characterization |
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