PbZrO 3 ‐Based Anti‐Ferroelectric Thin Films for High‐Performance Energy Storage: A Review (Adv. Mater. Technol. 10/2023)

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Advanced materials technologies 2023-05, Vol.8 (10)
Hauptverfasser: Wang, Xianwei, Yang, Fei, Yu, Kexin, Zhang, Bihui, Chen, Jingyao, Shi, Yujia, Yang, Peifan, He, Lifang, Li, Haonan, Liu, Rui, Li, Xiaofang, Hu, Yanchun, Shang, Jun, Yin, Shaoqian
Format: Artikel
Sprache:eng
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue 10
container_start_page
container_title Advanced materials technologies
container_volume 8
creator Wang, Xianwei
Yang, Fei
Yu, Kexin
Zhang, Bihui
Chen, Jingyao
Shi, Yujia
Yang, Peifan
He, Lifang
Li, Haonan
Liu, Rui
Li, Xiaofang
Hu, Yanchun
Shang, Jun
Yin, Shaoqian
description
doi_str_mv 10.1002/admt.202370047
format Article
fullrecord <record><control><sourceid>crossref</sourceid><recordid>TN_cdi_crossref_primary_10_1002_admt_202370047</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>10_1002_admt_202370047</sourcerecordid><originalsourceid>FETCH-LOGICAL-c847-10b0ed7a26d5145fa463a990a9ef1937cb58c2ea025cc7740305c3454a28bf543</originalsourceid><addsrcrecordid>eNpNkE1Lw0AYhBdRsNRePe9RD0nf_com3mJprVBp0RzES9hs3rSRfMgmtPSkP8Hf6C-xRRFPMwPDMDyEXDLwGQAfm7zufQ5caACpT8iAi0B5GqLn03_-nIy67hUAWMQCEfIBeV9lL25JBf36-Lw1HeY0bvryEGboXIsV2t6VliabsqGzsqo7WrSOzsv15tBZoTuk2jQW6bRBt97Tp751Zo03NKaPuC1xR6_ifOvTB9Oj82mCdtO0lU8ZjI9vry_IWWGqDke_OiTJbJpM5t5ieXc_iReeDaX2GGSAuTY8yBWTqjAyECaKwERYsEhom6nQcjTAlbVaSxCgrJBKGh5mhZJiSPyfWevarnNYpG-urI3bpwzSI8D0CDD9Ayi-ASzZZD0</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>PbZrO 3 ‐Based Anti‐Ferroelectric Thin Films for High‐Performance Energy Storage: A Review (Adv. Mater. Technol. 10/2023)</title><source>Wiley Online Library Journals Frontfile Complete</source><creator>Wang, Xianwei ; Yang, Fei ; Yu, Kexin ; Zhang, Bihui ; Chen, Jingyao ; Shi, Yujia ; Yang, Peifan ; He, Lifang ; Li, Haonan ; Liu, Rui ; Li, Xiaofang ; Hu, Yanchun ; Shang, Jun ; Yin, Shaoqian</creator><creatorcontrib>Wang, Xianwei ; Yang, Fei ; Yu, Kexin ; Zhang, Bihui ; Chen, Jingyao ; Shi, Yujia ; Yang, Peifan ; He, Lifang ; Li, Haonan ; Liu, Rui ; Li, Xiaofang ; Hu, Yanchun ; Shang, Jun ; Yin, Shaoqian</creatorcontrib><identifier>ISSN: 2365-709X</identifier><identifier>EISSN: 2365-709X</identifier><identifier>DOI: 10.1002/admt.202370047</identifier><language>eng</language><ispartof>Advanced materials technologies, 2023-05, Vol.8 (10)</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c847-10b0ed7a26d5145fa463a990a9ef1937cb58c2ea025cc7740305c3454a28bf543</citedby></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,776,780,27901,27902</link.rule.ids></links><search><creatorcontrib>Wang, Xianwei</creatorcontrib><creatorcontrib>Yang, Fei</creatorcontrib><creatorcontrib>Yu, Kexin</creatorcontrib><creatorcontrib>Zhang, Bihui</creatorcontrib><creatorcontrib>Chen, Jingyao</creatorcontrib><creatorcontrib>Shi, Yujia</creatorcontrib><creatorcontrib>Yang, Peifan</creatorcontrib><creatorcontrib>He, Lifang</creatorcontrib><creatorcontrib>Li, Haonan</creatorcontrib><creatorcontrib>Liu, Rui</creatorcontrib><creatorcontrib>Li, Xiaofang</creatorcontrib><creatorcontrib>Hu, Yanchun</creatorcontrib><creatorcontrib>Shang, Jun</creatorcontrib><creatorcontrib>Yin, Shaoqian</creatorcontrib><title>PbZrO 3 ‐Based Anti‐Ferroelectric Thin Films for High‐Performance Energy Storage: A Review (Adv. Mater. Technol. 10/2023)</title><title>Advanced materials technologies</title><issn>2365-709X</issn><issn>2365-709X</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2023</creationdate><recordtype>article</recordtype><recordid>eNpNkE1Lw0AYhBdRsNRePe9RD0nf_com3mJprVBp0RzES9hs3rSRfMgmtPSkP8Hf6C-xRRFPMwPDMDyEXDLwGQAfm7zufQ5caACpT8iAi0B5GqLn03_-nIy67hUAWMQCEfIBeV9lL25JBf36-Lw1HeY0bvryEGboXIsV2t6VliabsqGzsqo7WrSOzsv15tBZoTuk2jQW6bRBt97Tp751Zo03NKaPuC1xR6_ifOvTB9Oj82mCdtO0lU8ZjI9vry_IWWGqDke_OiTJbJpM5t5ieXc_iReeDaX2GGSAuTY8yBWTqjAyECaKwERYsEhom6nQcjTAlbVaSxCgrJBKGh5mhZJiSPyfWevarnNYpG-urI3bpwzSI8D0CDD9Ayi-ASzZZD0</recordid><startdate>202305</startdate><enddate>202305</enddate><creator>Wang, Xianwei</creator><creator>Yang, Fei</creator><creator>Yu, Kexin</creator><creator>Zhang, Bihui</creator><creator>Chen, Jingyao</creator><creator>Shi, Yujia</creator><creator>Yang, Peifan</creator><creator>He, Lifang</creator><creator>Li, Haonan</creator><creator>Liu, Rui</creator><creator>Li, Xiaofang</creator><creator>Hu, Yanchun</creator><creator>Shang, Jun</creator><creator>Yin, Shaoqian</creator><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>202305</creationdate><title>PbZrO 3 ‐Based Anti‐Ferroelectric Thin Films for High‐Performance Energy Storage: A Review (Adv. Mater. Technol. 10/2023)</title><author>Wang, Xianwei ; Yang, Fei ; Yu, Kexin ; Zhang, Bihui ; Chen, Jingyao ; Shi, Yujia ; Yang, Peifan ; He, Lifang ; Li, Haonan ; Liu, Rui ; Li, Xiaofang ; Hu, Yanchun ; Shang, Jun ; Yin, Shaoqian</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c847-10b0ed7a26d5145fa463a990a9ef1937cb58c2ea025cc7740305c3454a28bf543</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2023</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Wang, Xianwei</creatorcontrib><creatorcontrib>Yang, Fei</creatorcontrib><creatorcontrib>Yu, Kexin</creatorcontrib><creatorcontrib>Zhang, Bihui</creatorcontrib><creatorcontrib>Chen, Jingyao</creatorcontrib><creatorcontrib>Shi, Yujia</creatorcontrib><creatorcontrib>Yang, Peifan</creatorcontrib><creatorcontrib>He, Lifang</creatorcontrib><creatorcontrib>Li, Haonan</creatorcontrib><creatorcontrib>Liu, Rui</creatorcontrib><creatorcontrib>Li, Xiaofang</creatorcontrib><creatorcontrib>Hu, Yanchun</creatorcontrib><creatorcontrib>Shang, Jun</creatorcontrib><creatorcontrib>Yin, Shaoqian</creatorcontrib><collection>CrossRef</collection><jtitle>Advanced materials technologies</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Wang, Xianwei</au><au>Yang, Fei</au><au>Yu, Kexin</au><au>Zhang, Bihui</au><au>Chen, Jingyao</au><au>Shi, Yujia</au><au>Yang, Peifan</au><au>He, Lifang</au><au>Li, Haonan</au><au>Liu, Rui</au><au>Li, Xiaofang</au><au>Hu, Yanchun</au><au>Shang, Jun</au><au>Yin, Shaoqian</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>PbZrO 3 ‐Based Anti‐Ferroelectric Thin Films for High‐Performance Energy Storage: A Review (Adv. Mater. Technol. 10/2023)</atitle><jtitle>Advanced materials technologies</jtitle><date>2023-05</date><risdate>2023</risdate><volume>8</volume><issue>10</issue><issn>2365-709X</issn><eissn>2365-709X</eissn><doi>10.1002/admt.202370047</doi></addata></record>
fulltext fulltext
identifier ISSN: 2365-709X
ispartof Advanced materials technologies, 2023-05, Vol.8 (10)
issn 2365-709X
2365-709X
language eng
recordid cdi_crossref_primary_10_1002_admt_202370047
source Wiley Online Library Journals Frontfile Complete
title PbZrO 3 ‐Based Anti‐Ferroelectric Thin Films for High‐Performance Energy Storage: A Review (Adv. Mater. Technol. 10/2023)
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-15T13%3A33%3A21IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-crossref&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=PbZrO%203%20%E2%80%90Based%20Anti%E2%80%90Ferroelectric%20Thin%20Films%20for%20High%E2%80%90Performance%20Energy%20Storage:%20A%20Review%20(Adv.%20Mater.%20Technol.%2010/2023)&rft.jtitle=Advanced%20materials%20technologies&rft.au=Wang,%20Xianwei&rft.date=2023-05&rft.volume=8&rft.issue=10&rft.issn=2365-709X&rft.eissn=2365-709X&rft_id=info:doi/10.1002/admt.202370047&rft_dat=%3Ccrossref%3E10_1002_admt_202370047%3C/crossref%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true