双靶磁控溅射沉积Cu-W薄膜组织结构特征及其演变

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Veröffentlicht in:中国有色金属学报:英文版 2012, Vol.22 (11), p.2700-2706
1. Verfasser: 周灵平 汪明朴 彭坤 朱家俊 傅臻 李周
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ispartof 中国有色金属学报:英文版, 2012, Vol.22 (11), p.2700-2706
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source Access via ScienceDirect (Elsevier); Alma/SFX Local Collection
subjects Cu-W薄膜
Vegard规则
固溶度
层状结构
溅射沉积
非晶相
title 双靶磁控溅射沉积Cu-W薄膜组织结构特征及其演变
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