Cluster size and substrate temperature affecting thin film formation during copper cluster deposition on a Si （001） surface

The soft deposition of Cu clusters on a Si （001） surface was studied by molecular dynamics simulations. The embedded atom method, the Stillinger-Weber and the Lennar-Jones potentials were used to describe the interactions between the cluster atoms, between the substrate atoms, and between the cluste...

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Veröffentlicht in:	中国物理B：英文版 2012, Vol.21 (11), p.190-197
1. Verfasser:	龚恒风 吕炜 王鲁闽 李公平
Format:	Artikel
Sprache:	eng
Schlagworte:	Si（001） 分子动力学模拟 团簇 膜形成 表面沉积 衬底温度 铜 集群
Online-Zugang:	Volltext
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