Study of Nano-crystalline Silicon Films

Study of Nano-crystalline Silicon Films

By using strong hydrogen dilution of silane in PECVD system and controlling the deposition parameters strictly, we have prepared a-Si:H and nc-Si:H as well as μc-Si:H films respectively. The structural characters of nc-Si: H films detected by means of HREM, Raman and X-ray diffraction spectra are id...

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Veröffentlicht in:中国科学：数学英文版 1993 (2), p.248-256
1. Verfasser: 何宇亮 刘湘娜 王志超 程光煦 王路春 于是东
Format: Artikel
Sprache:eng
Schlagworte:
deposition
mierostructure
nano-crystalline
silicon
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Zusammenfassung:By using strong hydrogen dilution of silane in PECVD system and controlling the deposition parameters strictly, we have prepared a-Si:H and nc-Si:H as well as μc-Si:H films respectively. The structural characters of nc-Si: H films detected by means of HREM, Raman and X-ray diffraction spectra are identified as coinciding with the known definition of nanometer solids. The unique electrical and optical properties of nc-Si:H films are considered as the consequence of its novel structures.
ISSN:1674-7283
1869-1862