Revision of single atom local density and capturenumber varying with coverage in uniform depletion approximation and its effect on coalescence and number of stable clusters

In vapour deposition, single atoms （adatoms） on the substrate surface are the main source of growth. The change in its density plays a decisive role in the growth of thin films and quantum size islands. In the nucleation and cluster coalescence stages of vapour deposition, the growth of stable clust...

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Veröffentlicht in:	中国物理：英文版 2011, Vol.20 (8), p.317-326
1. Verfasser:	Shao Qing-Yi Zhang Juan
Format:	Artikel
Sprache:	eng
Schlagworte:	凝聚 原子密度 吸附原子 气相沉积法 稳定 覆盖效果 速率方程理论 集群
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