Thickness dependence of grain size and surface roughness for dc magnetron sputtered Au films

The grain size and surface morphology of sputtered Au films are studied by x-ray diffraction and atomic force microscope. For as-deposited samples the grain growth mechanism is consistent with the two-dimensional (2D) theory, which gives relatively low diffusion coefficient during deposition. Anneal...

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Veröffentlicht in:Chinese physics B 2010-08, Vol.19 (8), p.506-509
1. Verfasser: 张鑫 宋小会 张殿琳
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description The grain size and surface morphology of sputtered Au films are studied by x-ray diffraction and atomic force microscope. For as-deposited samples the grain growth mechanism is consistent with the two-dimensional (2D) theory, which gives relatively low diffusion coefficient during deposition. Annealing process demonstrates the secondary grain growth mechanism in which the thickness dependence of grain boundary energy plays a key role. The surface roughness increases with the increase of grain size.
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subjects Deposition
Diffraction
Gold
Grain boundaries
Grain growth
Grain size
Surface roughness
Two dimensional
原子力显微镜
晶粒尺寸
磁控溅射薄膜
表面形貌
表面粗糙度
金薄膜
title Thickness dependence of grain size and surface roughness for dc magnetron sputtered Au films
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