Multiple Pulse Damage Studies of BK-7, KCl and SiO2 at 532 nm
We report the results of damage studies at 532 nm on BK-7 glass, KCl, fused silica and two grades of crystalline quartz using a frequency doubled, Q-switched YAG laser. This work represents the initial stages of a program to investigate the mechanisms of multiple pulse laser-induced bulk damage in t...
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creator | Kitriotis, D Merkle, LD Dodson, A |
description | We report the results of damage studies at 532 nm on BK-7 glass, KCl, fused silica and two grades of crystalline quartz using a frequency doubled, Q-switched YAG laser. This work represents the initial stages of a program to investigate the mechanisms of multiple pulse laser-induced bulk damage in transparent solids. Comparison of BK-7 damage behavior with that of fused silica shows little effect due to the color center generation which occurs in BK-7 due to its small band gap. Commercially grown KCl exhibits multiple pulse catastrophic damage at fluences significantly below single pulse “threshold”, probably due to grown-in defects. Laser-induced damage behavior has been compared between two grades of crystalline quartz, with the surprising result that the nominally less perfect material is the more resistant to damage. The presence of “etch tunnels” may be involved, but considerably more study is required. |
doi_str_mv | 10.1520/STP18735S |
format | Book Chapter |
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This work represents the initial stages of a program to investigate the mechanisms of multiple pulse laser-induced bulk damage in transparent solids. Comparison of BK-7 damage behavior with that of fused silica shows little effect due to the color center generation which occurs in BK-7 due to its small band gap. Commercially grown KCl exhibits multiple pulse catastrophic damage at fluences significantly below single pulse “threshold”, probably due to grown-in defects. Laser-induced damage behavior has been compared between two grades of crystalline quartz, with the surprising result that the nominally less perfect material is the more resistant to damage. The presence of “etch tunnels” may be involved, but considerably more study is required.</description><identifier>ISBN: 0803144792</identifier><identifier>ISBN: 9780803144798</identifier><identifier>EISBN: 9780803150317</identifier><identifier>EISBN: 0803150318</identifier><identifier>DOI: 10.1520/STP18735S</identifier><language>eng</language><publisher>100 Barr Harbor Drive, PO Box C700, West Conshohocken, PA 19428-2959: ASTM International</publisher><subject>Borosilicate Glass ; Crystalline Quartz ; Fused Silica ; Multiple Pulse Damage ; Potassium Chloride ; Pulse Repetition Frequency</subject><ispartof>Laser Induced Damage in Optical Materials: 1985, 1988, p.138-145</ispartof><rights>All rights reserved. This material may not be reproduced or copied, in whole or in part, in any printed, mechanical, electronic, film, or other distribution and storage media, without the written consent of the publisher. 1988 ASTM International</rights><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>777,778,782,791,27912</link.rule.ids></links><search><creatorcontrib>Kitriotis, D</creatorcontrib><creatorcontrib>Merkle, LD</creatorcontrib><creatorcontrib>Dodson, A</creatorcontrib><title>Multiple Pulse Damage Studies of BK-7, KCl and SiO2 at 532 nm</title><title>Laser Induced Damage in Optical Materials: 1985</title><description>We report the results of damage studies at 532 nm on BK-7 glass, KCl, fused silica and two grades of crystalline quartz using a frequency doubled, Q-switched YAG laser. This work represents the initial stages of a program to investigate the mechanisms of multiple pulse laser-induced bulk damage in transparent solids. Comparison of BK-7 damage behavior with that of fused silica shows little effect due to the color center generation which occurs in BK-7 due to its small band gap. Commercially grown KCl exhibits multiple pulse catastrophic damage at fluences significantly below single pulse “threshold”, probably due to grown-in defects. Laser-induced damage behavior has been compared between two grades of crystalline quartz, with the surprising result that the nominally less perfect material is the more resistant to damage. The presence of “etch tunnels” may be involved, but considerably more study is required.</description><subject>Borosilicate Glass</subject><subject>Crystalline Quartz</subject><subject>Fused Silica</subject><subject>Multiple Pulse Damage</subject><subject>Potassium Chloride</subject><subject>Pulse Repetition Frequency</subject><isbn>0803144792</isbn><isbn>9780803144798</isbn><isbn>9780803150317</isbn><isbn>0803150318</isbn><fulltext>true</fulltext><rsrctype>book_chapter</rsrctype><creationdate>1988</creationdate><recordtype>book_chapter</recordtype><sourceid/><recordid>eNqNjssKwjAURCMi-OrCP7grVz5u0oakCzdWRShiod2HSFup9iEk9futIq5dHIaBGTiEzCiuKGe4jpOISuHyuEccX0iU6FLeIfpk_CmeJ3w2JI4xN0Sknt8hR2RzaktbPMoMorY0Gex0pa8ZxLZNi8xAk8M2XIoFhEEJuk4hLs4MtAXuMqirKRnkurs535yQ-WGfBMelNrZSl6a5G_VkiqJ6S6qfpPv38AWZNDuh</recordid><startdate>19880101</startdate><enddate>19880101</enddate><creator>Kitriotis, D</creator><creator>Merkle, LD</creator><creator>Dodson, A</creator><general>ASTM International</general><scope/></search><sort><creationdate>19880101</creationdate><title>Multiple Pulse Damage Studies of BK-7, KCl and SiO2 at 532 nm</title><author>Kitriotis, D ; Merkle, LD ; Dodson, A</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-astm_books_v2_10_1520_STP18735S3</frbrgroupid><rsrctype>book_chapters</rsrctype><prefilter>book_chapters</prefilter><language>eng</language><creationdate>1988</creationdate><topic>Borosilicate Glass</topic><topic>Crystalline Quartz</topic><topic>Fused Silica</topic><topic>Multiple Pulse Damage</topic><topic>Potassium Chloride</topic><topic>Pulse Repetition Frequency</topic><toplevel>online_resources</toplevel><creatorcontrib>Kitriotis, D</creatorcontrib><creatorcontrib>Merkle, LD</creatorcontrib><creatorcontrib>Dodson, A</creatorcontrib></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Kitriotis, D</au><au>Merkle, LD</au><au>Dodson, A</au><format>book</format><genre>bookitem</genre><ristype>CHAP</ristype><atitle>Multiple Pulse Damage Studies of BK-7, KCl and SiO2 at 532 nm</atitle><btitle>Laser Induced Damage in Optical Materials: 1985</btitle><date>1988-01-01</date><risdate>1988</risdate><spage>138</spage><epage>145</epage><pages>138-145</pages><isbn>0803144792</isbn><isbn>9780803144798</isbn><eisbn>9780803150317</eisbn><eisbn>0803150318</eisbn><abstract>We report the results of damage studies at 532 nm on BK-7 glass, KCl, fused silica and two grades of crystalline quartz using a frequency doubled, Q-switched YAG laser. This work represents the initial stages of a program to investigate the mechanisms of multiple pulse laser-induced bulk damage in transparent solids. Comparison of BK-7 damage behavior with that of fused silica shows little effect due to the color center generation which occurs in BK-7 due to its small band gap. Commercially grown KCl exhibits multiple pulse catastrophic damage at fluences significantly below single pulse “threshold”, probably due to grown-in defects. Laser-induced damage behavior has been compared between two grades of crystalline quartz, with the surprising result that the nominally less perfect material is the more resistant to damage. The presence of “etch tunnels” may be involved, but considerably more study is required.</abstract><cop>100 Barr Harbor Drive, PO Box C700, West Conshohocken, PA 19428-2959</cop><pub>ASTM International</pub><doi>10.1520/STP18735S</doi><tpages>8</tpages></addata></record> |
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identifier | ISBN: 0803144792 |
ispartof | Laser Induced Damage in Optical Materials: 1985, 1988, p.138-145 |
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language | eng |
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source | Alma/SFX Local Collection |
subjects | Borosilicate Glass Crystalline Quartz Fused Silica Multiple Pulse Damage Potassium Chloride Pulse Repetition Frequency |
title | Multiple Pulse Damage Studies of BK-7, KCl and SiO2 at 532 nm |
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