High Dielectric Constant Materials: VLSI MOSFET Applications

Issues relating to the high-K gate dielectric are among the greatest challenges for the evolving International Technology Roadmap for Semiconductors (ITRS). More than just an historical overview, this book will assess previous and present approaches related to scaling the gate dielectric and their i...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Huff, H.R, Gilmer, D.C
Format:	Buch
Sprache:	eng
Schlagworte:	Chemistry and Materials Science Condensed Matter Physics Dielectrics Engineering Engineering, general Integrated circuits Materials Science Optical and Electronic Materials Surfaces and Interfaces, Thin Films
Online-Zugang:	Volltext
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