Noise induced effects at nano-structured thin films growth during deposition in plasma-condensate devices
We perform a comprehensive study of noise-induced effects in a stochastic model of reaction-diffusion type, describing nano-structured thin films growth at condensation. We introduce an external flux of adsorbate between neighbour monoatomic layers caused by the electrical field presence near substr...
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| description | We perform a comprehensive study of noise-induced effects in a stochastic model of reaction-diffusion type, describing nano-structured thin films growth at condensation. We introduce an external flux of adsorbate between neighbour monoatomic layers caused by the electrical field presence near substrate in plasma-condensate devices. We take into account that the strength of the electric field fluctuates around its mean value. We discuss a competing influence of the regular and stochastic parts of the external flux onto the dynamics of adsorptive system. It will be shown that the introduced fluctuations induce first-order phase transition in a homogeneous system, govern the pattern formation in a spatially extended system; these parts of the flux control the dynamics of the patterning, spatial order, morphology of the surface, growth law of the mean size of adsorbate islands, type and linear size of surface structures. The influence of the intensity of fluctuations onto scaling and statistical properties of the nano-structured surface is analysed in detail. This study provides an insight into the details of noise induced effects at pattern formation processes in anisotropic adsorptive systems. |
| doi_str_mv | 10.48550/arxiv.2009.14076 |
| format | Article |
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We introduce an external flux of adsorbate between neighbour monoatomic layers caused by the electrical field presence near substrate in plasma-condensate devices. We take into account that the strength of the electric field fluctuates around its mean value. We discuss a competing influence of the regular and stochastic parts of the external flux onto the dynamics of adsorptive system. It will be shown that the introduced fluctuations induce first-order phase transition in a homogeneous system, govern the pattern formation in a spatially extended system; these parts of the flux control the dynamics of the patterning, spatial order, morphology of the surface, growth law of the mean size of adsorbate islands, type and linear size of surface structures. The influence of the intensity of fluctuations onto scaling and statistical properties of the nano-structured surface is analysed in detail. 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This study provides an insight into the details of noise induced effects at pattern formation processes in anisotropic adsorptive systems.</description><subject>Adsorbates</subject><subject>Adsorptivity</subject><subject>Condensates</subject><subject>Electric field strength</subject><subject>Flux</subject><subject>Noise</subject><subject>Patterning</subject><subject>Phase transitions</subject><subject>Physics - Mesoscale and Nanoscale Physics</subject><subject>Stochastic models</subject><subject>Substrates</subject><subject>Surface chemistry</subject><subject>Thin films</subject><issn>2331-8422</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2020</creationdate><recordtype>article</recordtype><sourceid>ABUWG</sourceid><sourceid>AFKRA</sourceid><sourceid>AZQEC</sourceid><sourceid>BENPR</sourceid><sourceid>CCPQU</sourceid><sourceid>DWQXO</sourceid><sourceid>GOX</sourceid><recordid>eNotkEtLAzEYRYMgWGp_gCsDrqfmMUmmSyk-CkU33Q-Z5Eub0iZjkqn67x1bV3dxL4fLQeiOknndCEEedfr2pzkjZDGnNVHyCk0Y57RqasZu0CznPSGEScWE4BPk36PPgH2wgwGLwTkwJWNdcNAhVrmkwZQhjVXZ-YCdPxwz3qb4VXbYDsmHLbbQx-yLj2HE4P6g81FXJgYLIesCY3_yBvItunb6kGH2n1O0eXneLN-q9cfravm0rrRgshJAlYbGNc4QgIXpqBo_0YVuiANhrLBUg3LE1mC07hradbJWgrtOcUuV5FN0f8GePbR98kedfto_H-3Zx7h4uCz6FD8HyKXdxyGF8VPL6lpxRSWX_BfMhGZ9</recordid><startdate>20200929</startdate><enddate>20200929</enddate><creator>Kharchenko, V O</creator><creator>Dvornichenko, A V</creator><creator>Kharchenko, D O</creator><general>Cornell University Library, arXiv.org</general><scope>8FE</scope><scope>8FG</scope><scope>ABJCF</scope><scope>ABUWG</scope><scope>AFKRA</scope><scope>AZQEC</scope><scope>BENPR</scope><scope>BGLVJ</scope><scope>CCPQU</scope><scope>DWQXO</scope><scope>HCIFZ</scope><scope>L6V</scope><scope>M7S</scope><scope>PIMPY</scope><scope>PQEST</scope><scope>PQQKQ</scope><scope>PQUKI</scope><scope>PRINS</scope><scope>PTHSS</scope><scope>GOX</scope></search><sort><creationdate>20200929</creationdate><title>Noise induced effects at nano-structured thin films growth during deposition in plasma-condensate devices</title><author>Kharchenko, V O ; Dvornichenko, A V ; Kharchenko, D O</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-a526-5e17ae8f8fc0ee9cb17eff19a80fe5cd5d1ae7f0d4ecaab81bb64753fb73d1763</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2020</creationdate><topic>Adsorbates</topic><topic>Adsorptivity</topic><topic>Condensates</topic><topic>Electric field strength</topic><topic>Flux</topic><topic>Noise</topic><topic>Patterning</topic><topic>Phase transitions</topic><topic>Physics - Mesoscale and Nanoscale Physics</topic><topic>Stochastic models</topic><topic>Substrates</topic><topic>Surface chemistry</topic><topic>Thin films</topic><toplevel>online_resources</toplevel><creatorcontrib>Kharchenko, V O</creatorcontrib><creatorcontrib>Dvornichenko, A V</creatorcontrib><creatorcontrib>Kharchenko, D O</creatorcontrib><collection>ProQuest SciTech Collection</collection><collection>ProQuest Technology Collection</collection><collection>Materials Science & Engineering Collection</collection><collection>ProQuest Central (Alumni Edition)</collection><collection>ProQuest Central UK/Ireland</collection><collection>ProQuest Central Essentials</collection><collection>ProQuest Central</collection><collection>Technology Collection (ProQuest)</collection><collection>ProQuest One Community College</collection><collection>ProQuest Central Korea</collection><collection>SciTech Premium Collection</collection><collection>ProQuest Engineering Collection</collection><collection>Engineering Database</collection><collection>Publicly Available Content Database</collection><collection>ProQuest One Academic Eastern Edition (DO NOT USE)</collection><collection>ProQuest One Academic</collection><collection>ProQuest One Academic UKI Edition</collection><collection>ProQuest Central China</collection><collection>Engineering Collection</collection><collection>arXiv.org</collection><jtitle>arXiv.org</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Kharchenko, V O</au><au>Dvornichenko, A V</au><au>Kharchenko, D O</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Noise induced effects at nano-structured thin films growth during deposition in plasma-condensate devices</atitle><jtitle>arXiv.org</jtitle><date>2020-09-29</date><risdate>2020</risdate><eissn>2331-8422</eissn><abstract>We perform a comprehensive study of noise-induced effects in a stochastic model of reaction-diffusion type, describing nano-structured thin films growth at condensation. We introduce an external flux of adsorbate between neighbour monoatomic layers caused by the electrical field presence near substrate in plasma-condensate devices. We take into account that the strength of the electric field fluctuates around its mean value. We discuss a competing influence of the regular and stochastic parts of the external flux onto the dynamics of adsorptive system. It will be shown that the introduced fluctuations induce first-order phase transition in a homogeneous system, govern the pattern formation in a spatially extended system; these parts of the flux control the dynamics of the patterning, spatial order, morphology of the surface, growth law of the mean size of adsorbate islands, type and linear size of surface structures. The influence of the intensity of fluctuations onto scaling and statistical properties of the nano-structured surface is analysed in detail. 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| subjects | Adsorbates Adsorptivity Condensates Electric field strength Flux Noise Patterning Phase transitions Physics - Mesoscale and Nanoscale Physics Stochastic models Substrates Surface chemistry Thin films |
| title | Noise induced effects at nano-structured thin films growth during deposition in plasma-condensate devices |
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