Efficient Bayesian inversion for shape reconstruction of lithography masks

Background: Scatterometry is a fast, indirect and non-destructive optical method for quality control in the production of lithography masks. To solve the inverse problem in compliance with the upcoming need for improved accuracy, a computationally expensive forward model has to be defined which maps...

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Veröffentlicht in:	arXiv.org 2020-05
Hauptverfasser:	Farchmin, Nando, Hammerschmidt, Martin, Schneider, Philipp-Immanuel, Wurm, Matthias, Bodermann, Bernd, Bär, Markus, Heidenreich, Sebastian
Format:	Artikel
Sprache:	eng
Schlagworte:	Bayesian analysis Geometry Inverse problems Light diffraction Lithography Luminous intensity Masks Mathematical models Model accuracy Nondestructive testing Order parameters Parameter uncertainty Physics - Accelerator Physics Physics - Data Analysis, Statistics and Probability Polynomials Quality control Reconstruction Sensitivity analysis Statistical inference
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